Amorphous silicon powder exhibiting microstructural properties such as nanometer-size, large presence of silicon-hydride groups and high surface/volume ratio has been produced in a plasma enhanced chemical vapor deposition (PECVD) reactor using pure silane gas and low frequency square-wave-modulated (SQWM) rf power (13.56 MHz). The possible crystallinity of nanometer-size domains embedded in the amorphous network was studied with Raman spectroscopy and electron diffraction analysis.
Photoluminescence (PL) in the near IR-VIS region was excited by an Ar laser. The PL intensity exhibits very unusual properties: a supralinear dependence on excitation power and an exponential decrease with pressure (below 50 Pa). The analysis of PL dynamics led us to propose a mathematical model of excitation of the PL. This model involves the existence of an intermediate step, with an extremely long lifetime, that controls the PL dynamics.