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Development and Characterization of Artificial Microstructures in Long Lengths of Superconducting Wire

Published online by Cambridge University Press:  15 February 2011

P. D. Jablonski ,
P. J. Lee  and
D. C. Larbalestier
P. D. Jablonski
Affiliation:
Department of Materials Science and Engineering, University of Wisconsin-Madison, 1500 Johnson Drive, Madison, Wisconsin 53706
P. J. Lee
Affiliation:
Applied Superconductivity Center and Department of Materials Science and Engineering, University of Wisconsin-Madison, 1500 Johnson Drive, Madison, Wisconsin 53706
D. C. Larbalestier
Affiliation:
Department of Materials Science and Engineering, University of Wisconsin-Madison, 1500 Johnson Drive, Madison, Wisconsin 53706
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Abstract

Conventional Nb-Ti superconductors are optimized by thermal and mechanical treatments which ultimately produce a nanostructure consisting of 1-2nm thick ribbons of α-Ti dispersed in a matrix of β-Nb-Ti. Several groups are now investigating artificial dispersions of second phase in Nb-Ti which may develop stronger flux pinning nanostructures. However, these new methods generally require true strains of 30 or more. We avoid these large strains (and their associated problems) by forming our composites from a mixture ∼ -50¼m size Nb and Nb-Ti powders, thus permitting the desired nanostructure to be produced with strains of order 12. Nb pinning particles were found to develop an irregular shape, tending to nanometer thick ribbons at large strains. The final size nanostructure resembles conventional Nb-Ti, except that the “second” phase is Nb rather than α-Ti. The critical current density (Jc) was found to increase by over two orders of magnitude to peak values of 5490 and 1980A/mm2 at 2 and 5T as the particle thickness was reduced.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 351: Symposium V – Molecularly Designed Ultrafine/Nanostructured Materials , 1994 , 455
Copyright
Copyright © Materials Research Society 1994

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References

REFERENCES

[1] Lee, P. J., McKinnell, J. C., and Larbalestier, D. C., Adv. Cryo. Eng. (Materials) 36 287 (1989).Google Scholar
[2] Dorofejev, G. L., Klimenko, E. Y., Frolov, S. V., Nikulenkov, E. V., Plashkin, E. I., Salunin, N. I., and Filkin, V. Y., in Proc. of 9th Inter. Conf. on Magnet Technology, ed. by Marinucci, C. and Weymuth, P., pp 564–566, 1985.Google Scholar
[3] Matsumoto, K., Takewaki, H., Tanaka, Y., Miura, O., Yamafuji, K., Funaki, K., Iwakuma, M., and Matsushita, T., Appl. Phys. Lett. 64 115 (1994).Google Scholar
[4] Seuntjens, J. M. and Larbalestier, D. C., IEEE Trans MAG 27 1120 1990.Google Scholar
[5] Zeitlin, B., Walker, M. and Motowidlo, L., US Patent No. 4,803,310, (February 7, 1989).Google Scholar
[6] Scanlan, R. M., Lietzke, A., Royet, J., Wandesforde, A., Taylor, C. E., Wong, J. and Rudziak, M. K., To appear in Proc. of 13th Inter. Conf. on Magnet Technology (1993).Google Scholar
[7] Jablonski, P. D. and Larbalestier, D. C., US Patent No. 5,226,947, (July 13, 1993).Google Scholar
[8] Meingast, C., and Larbalestier, D. C., J. Appl. Phys. 66 5971 (1989).Google Scholar
[9] Kaufmann, A. R., US Patent No. 3099041 (July 30, 1963), and US Patent No. 3802816 (April 9, 1974).Google Scholar
[10] Russ, J. C., Computer-Assisted Microscopy: The Measurement and Analysis of Images, (Plenum Press, NY), 175–218 (1990).Google Scholar
[11] Meingast, C., Lee, P. J., and Larbalestier, D. C., J. Appl. Phys. 66 5962 (1989).Google Scholar
[12] Hosford, W. F. Jr., Trans. AIME 12 12 (1964).Google Scholar
[13] Malzhn-Kampe, J. C. and Courtney, T. H., Scripta Met. 23 141–145 (1989).Google Scholar
[14] Heussner, R. W., Jablonski, P. D., Lee, P. J., and Larbalestier, D. C., to appear in Adv. Cry. Eng. 40 (1994).Google Scholar
[15] Cooley, L. D., Lee, P. J., O'Leary, P., Larbalestier, D. C., Appl. Phys. Lett. 64 1298 (1994).Google Scholar
[16] Cooley, L. D., and Jablonski, P. D., unpublished work UW-Madison, (1991).Google Scholar
[17] Jablonski, P. D., Lee, P. J., and Larbalestier, D. C., Appl. Phys. Lett. (1994) (submitted).Google Scholar
[18] Cooley, L. D., Stejic, G., and Larbalestier, D. C., Phys. Rev. B 46 2964 (1992).Google Scholar