Developing very thin molecular sieve films (<lμm), required by many zeolite filmbased applications, has been found continually to be a technical challenge. The synthesis strategy of this work is to elucidate some of the parameters that influence the morphology, orientation, surface coverage density and thickness of Si-ZSM-5 films on supported substrates. Three different methods to grow zeolite coatings on fused silica have be studied and compared. The zeolite films have been characterized by field emission-SEM, XRD, sorption study and transmitting spectroscopy. At the early stage of crystal growth, the gel layer spontaneously condensed on the substrate surface may have a large porosity of 15%. The strong affinity to grow the (010) faces along the substrate surface is possibly responsible for the preferred orientation of the films. The conditions for synthesis of closely packed coatings, consisting of sub-micron crystals with preferred orientation, are also identified. Engineering issues for fabrication of low optical scattering zeolitic films will also be discussed for designing molecular sieve optical devices.