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Density measurement of W thin films coating by combinationof ion beam analysis and scanning electron microscopy

Published online by Cambridge University Press:  14 April 2005

C. Wang ,
P. Brault  and
T. Sauvage
C. Wang
Affiliation:
Groupe de Recherches sur l'Énergétique des Milieux Ionisés, UMR 6606-CNRS, Institut Polytechnique de l'Université d'Orléans, BP 6744, 45067 Orleans Cedex 2, France School of Science, Beijing University of Astronautics and Aeronautics, 100083 Beijing, P.R. China
P. Brault*
Affiliation:
Groupe de Recherches sur l'Énergétique des Milieux Ionisés, UMR 6606-CNRS, Institut Polytechnique de l'Université d'Orléans, BP 6744, 45067 Orleans Cedex 2, France
T. Sauvage
Affiliation:
Centre d'Études et de Recherches par Irradiations, 3A rue de la Férollerie, 45071 Orleans Cedex 2, France
*
Pascal.Brault@univ-orleans.fr
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Abstract

W-Cu-W sandwich coatings are prepared by d.c. magnetron sputtering and the film density is evaluated by RBS and scanning electron spectroscopy measurements. In order to improve the film density up to the bulk density and obtain a dense metallic coating, it is necessary and effective to optimize the deposition parameters, such as, increasing target power and decreasing Ar working pressure. The reduction of the film density from its bulk density is induced by microstructure change and incorporated impurity gas, such as oxygen and argon. When film density is increased, oxygen contamination, due to wall desorption or sample storage in air, decreases.

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Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 31 , Issue 1 , July 2005 , pp. 17 - 22
Copyright
© EDP Sciences, 2005

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