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Surface alloying of metallic substrates with pre-deposited films through a pulsed electron-beam mixing

Published online by Cambridge University Press:  30 April 2008

A. V. Batrakov ,
A. B. Markov ,
G. E. Ozur ,
D. I. Proskurovsky  and
V. P. Rotshtein
A. V. Batrakov*
Affiliation:
Institute of High-Current Electronics, 2/3 Academichesky av., Tomsk 634055, Russia
A. B. Markov
Affiliation:
Institute of High-Current Electronics, 2/3 Academichesky av., Tomsk 634055, Russia
G. E. Ozur
Affiliation:
Institute of High-Current Electronics, 2/3 Academichesky av., Tomsk 634055, Russia
D. I. Proskurovsky
Affiliation:
Institute of High-Current Electronics, 2/3 Academichesky av., Tomsk 634055, Russia
V. P. Rotshtein
Affiliation:
Institute of High-Current Electronics, 2/3 Academichesky av., Tomsk 634055, Russia
*
a_v_batrakov@mail.ru
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Abstract

Microstructure and properties of the surface alloys resulted from a pulsed liquid-phase mixing of metallic substrates with pre-deposited films were studied. As a tool for the liquid-phase mixing, a low-energy (~30 keV), high-current (~30 kA) pulsed (0.8–3 µs) electron beam of energy density ranging from 1 to 15 J cm−2 has been employed. Three immiscible systems (Ta/Fe; Al/Si/Al/Si/Al/Si/Al; Al/C/Al/C/Al) and two systems with different solid solubility of components (Cu/316 stainless steel; Zr/Ti/Ti-6Al-4V) were chosen for the surface alloying investigation.

Keywords

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