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Wafer Temperature Measurement: Status Utilizing Optical Fibers

Published online by Cambridge University Press:  10 February 2011

Chuck Schietinger  and
Earl Jensen
Chuck Schietinger
Affiliation:
Luxtron / Accufiber 2775 Northwestern Parkway, Santa Clara, CA 95051
Earl Jensen
Affiliation:
Luxtron / Accufiber 2775 Northwestern Parkway, Santa Clara, CA 95051
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Abstract

This paper reviews the current status and problems of optical fiber temperature measurements for RTP and single wafer processing. Included is a discussion of a range of fiber based options available and currently being utilized today. The advantages and disadvantages of the options are presented. In addition new data from the use of the Ripple Technique pyrometer is presented. Included are data from AT&T (Lucent Technologies) ripple pyrometer development. Lucent Technologies is evaluating and improving the ripple pyrometer on a number of different style production RTP furnaces. Recent advances in signal processing for very low level photo diode currents in the range of 10 e-14 amps, will also be presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 429: Symposium N – Rapid Thermal and Integrated Processing V , 1996 , 283
Copyright
Copyright © Materials Research Society 1996

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References

1. Bohnet, W.J., U.S. Patent No. 2,709,367 (31 May 1955).Google Scholar
2. Dils, R.R., U.S. Patent No. 4,750,139 (7 June 1988).Google Scholar
3. Tinsley, F.G. Bear, Adams, B., Evolution in the Application of Optical Fiber Thermometry, ISA / 91 Advances in Instrum. and Control, Vol 46, Oct. 27–31, 1991.Google Scholar
4. Schietinger, C., Chapter 3 and 4 in Advances in Rapid Thermal and Integrated Processing edited by Roozeboom, F., Kluwer Academic Publishers, Dordrecht, The Netherlands, 1996.Google Scholar
5. Ono, A., Chapter 10 in Theory and Practice of Radiation Thermometry, edited by Witt, D.P. De and Nutter, G.D., Wiley, New York, (1988) pp. 576,612 and 613.Google Scholar
6. Gronet, Christian M. and Miner, Gary E., European Patent Application Publication No. 612 862, (24 Jan. 1994).Google Scholar
7. Vandenabeele, P. and Maex, K., J. Vac. Sci. Technol. B, 9, 2784–2787 (1991).Google Scholar
8. Pettibone, D.W., Suarez, J.R., and Gat, A., Mater. Res. Soc. Symp. Proc. 52, pp. 209–216 (1986).Google Scholar
9. Schietinger, C. and Peuse, B., Symp. Proc. RTP '95, Amsterdam, The Netherlands, pp. 225–233.Google Scholar
10. Schietinger, C., Adams, B. and Yarling, C., Mater. Res. Soc. Symp. Proc. 224, (1991) pp. 23–31.Google Scholar
11. Schietinger, C. and Adams, B., U.S. Patents 5,154,512 (13 Oct. 1992), 5,166,080 (24 Nov. 1992), 5,310,260 (10 May 1994 ), 5,318,362 (7 June 1994), 5,490,728 (13 Feb. 1996).Google Scholar
12. Fiory, A.T., U.S. Patents 5,305,416 (April 1994), 5,442,727 (15 Aug. 1995).Google Scholar
13. Oh, M., Nguyenphu, B., and Fiory, A.T., Mater. Res. Soc. Symp. Proc. 387, (1995) pp. 131–136.Google Scholar
14. Oh, M., Nguyenphu, B., Hansen, Mark H. and Fiory, A.T., Temperature Control Monitoring By Ripple Pyrometry In Rapid Thermal Processing, Presented at 1996 MRS Spring Meeting San Francisco.Google Scholar
15. Xu, H. and Sturm, J.C., Mater. Res. Soc. Symp. Proc. 387, (1995) pp. 29–34.Google Scholar