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Visible-Wavelength Laser Photodeposition of Cobalt Interconnects

Published online by Cambridge University Press:  21 February 2011

M. Rothschild ,
J. H. C. Sedlacek ,
D. C. Shaver ,
D. J. Ehrlich ,
S. N. Bittenson ,
D. Edwards Jr.  and
N. P. Economou
M. Rothschild
Affiliation:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173-9108
J. H. C. Sedlacek
Affiliation:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173-9108
D. C. Shaver
Affiliation:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173-9108
D. J. Ehrlich
Affiliation:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173-9108
S. N. Bittenson
Affiliation:
Micrion Corporation, Peabody, Massachusetts 01960
D. Edwards Jr.
Affiliation:
Micrion Corporation, Peabody, Massachusetts 01960
N. P. Economou
Affiliation:
Micrion Corporation, Peabody, Massachusetts 01960
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Abstract

Cobalt interconnects were deposited with a cw visiblewavelength laser from gaseous Co2 (CO)8. The deposited material was high-purity Co, and its electrical resistivity was as low as 13 μΩ-cm (twice that of bulk resistivity). The deposition is initiated by photochemical decomposition of Co2 (CO)8, and therefore process parameters (pressure, power, writing speed) are insensitive to the optical and thermal properties of the substrate.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 158: Symposium B – In-Situ Patterning: Selective Area Deposition and Etching , 1989 , 79
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

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