Hostname: page-component-745bb68f8f-grxwn Total loading time: 0 Render date: 2025-01-28T23:58:53.323Z Has data issue: false hasContentIssue false
  • English
  • Français

Visible Luminescence from Laser-Induced Stain- and Dry Etched Silicon

Published online by Cambridge University Press:  15 February 2011

D. Dimova-Malinovska ,
M. Tzolov  and
N. Malinowski
D. Dimova-Malinovska
Affiliation:
Central Laboratory for Solar Energy and New Energy Sources, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussée Blvd., 1784 Sofia, Bulgaria, photomat@bgearn.bitnet
M. Tzolov
Affiliation:
Central Laboratory for Solar Energy and New Energy Sources, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussée Blvd., 1784 Sofia, Bulgaria, photomat@bgearn.bitnet
N. Malinowski
Affiliation:
Max-Plank-Institut fur Festkorperforschung, Heisenbergstrasse 1, D-7000 Stuttgart, Germany
Get access

Abstract

Light emitting silicon has been prepared by Ar laser (514.5 nm) induced stain etching and Nd:YAG impulse (532 nm) laser irradiation in air. Photoluminescence (PL), IR and XPS spectra have been studied. The intensity and position of the PL depend on the power or the energy and the duration of laser beam treatment during the etching. Correlation between the PL and chemical bonding is discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 397: Symposium B – Advanced laser Processing of Materials-Fundamentals and Applications , 1995 , 503
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Canham, L. T., Appl. Phys. Lett. 57, 1046 (1990).Google Scholar
2 Fathauer, R. W., George, T., Ksendzov, A. and Vasquez, R. P., Appl. Phys. Lett. 60, 995 (1992).Google Scholar
3 Hummel, R. E., Morrone, A., Ludwig, M. and Chang, S.-S., Appl. Phys. Lett. 63, 2771 (1993).Google Scholar
4 Noguchi, N. and Suemune, I., J. Appl. Phys. 75, 4765 (1994).Google Scholar
5 Tsai, C., Li, K.-H., Campbell, J. C., Hance, B.K., Arendt, M. F., White, J. M., Yau, S. L. and Bard, A. J., J. Electr. Mat. 21, 995 (1992).Google Scholar
6 Cheah, K. W. and Chey, C. H., Sol. St. Commun. 91, 795 (1994).Google Scholar
7 Kontkiewicz, A. J., Kontkiewicz, A. M., Siejka, J., Seu, S., Nowak, G., Hoff, A. M., Saktivel, P., Ahmed, K., Mukherjel, P., Witonachi, S., Lagowski, J., Appl. Phys. Lett. 65, 1436 (1994).Google Scholar
8 Sarathy, J., Shih, S., Jung, Kim, Tsai, C., Li, K.-H., Kwong, D.-L., Campbell, J.C., Youe, Shueh-li and Bard, A. J., Appl. Phys. Lett. 60, 1532 (1992).Google Scholar
9 Münder, H., Andrzejak, C., Berger, M. G., Klemradt, U., Luth, H., Herino, R. and Ligeon, M., Thin Solid Films 221, 27 (1992).Google Scholar
10 Dimova-Malinovska, D., Sendo va-Vassileva, M., Marinova, Ts., Krastev, V., Kamenova, M., Tzenov, N., Thin solid films 255, 191 (1995).Google Scholar
11 Colthup, N. B., Daly, L. H. and Wiberly, S. E.. Introduction to Infrared and Raman Spectroscopy, (1990 Academic Press).Google Scholar
12 Houle, F.A., Phys. Rev. B 39, 10120 (1989).Google Scholar
13 Shih, S., Jung, K. H., Hsieh, T. Y., Sarathy, J., Campbell, J. C. and Kwong, D. L., Appl. Phys. Lett. 60, 1863 (1992).Google Scholar
14 Cullis, A. G., Canham, L. T., Williams, G. M., Smith, P. W. and Dosser, O. D., J. Appl. Phys. 75, 493 (1994).Google Scholar
15 Dimova-Malinovska, D., Janvier, C., Sendova-Vassileva, M., Kamenova, M., Marinova, Ts., Krastev, V., Balkan J. Phys., (1995) (in press.).Google Scholar
16 Prokes, S. M., Appl. Phys. Lett. 62, 3244 (1993).Google Scholar
17 Tsybeskov, L., Vandyskev, Ju. V. and Fancher, P. M., Phys. Rev. B 49, 7821 (1994).Google Scholar
18 Dimova-Malinovska, D., Kamenova, M., Marinova, Ts., Krastev, V. and Sendova-Vassileva, M., Proc. of the 6th European Conference on Applications of Surface and Interface Analysis, Montreux Oct. 9-13 1995 (in press)Google Scholar
19 Sendova-Vassileva, M., Tzenov, N., Dimova-Malinovska, D., Marinova, Ts. and Krastev, V., Proc of the EMRS ‘95, Symposium I (in press)Google Scholar
20 Canham, L.T., Loni, A., Calcott, P. D. J., Simons, A. J., Reeves, C., Houlton, M., Newey, J.P., Nash, K.J. and Cox, T.I., Proc. Of the EMRS Spring Meeting, Strasbourg, May 22-26, 1995, Symposium I (in press)Google Scholar
21 Anedda, A., Bongiovanni, G., Cannas, M., Congiu, F. and Mura, A., J. Appl. Phys. 74, 6993 (1993).Google Scholar
22 Kanemitsu, Y., Phys. Rev. B 49, 16845 (1994).Google Scholar