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Transient Conductance Measurements And Heat-Flow Analysis of Pulsed-Laser-Induced Melting of Aluminum Thin Films

Published online by Cambridge University Press:  26 February 2011

J. Y. Tsao ,
S. T. Picraux ,
P. S. Peercy  and
Michael O. Thompson
J. Y. Tsao
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
S. T. Picraux
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
P. S. Peercy
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185
Michael O. Thompson
Affiliation:
Cornell University, Ithaca, NY 14853
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Abstract

We report time-resolved electrical-resistance measurements during pulsed-laser melting of a metal, aluminum. The resistances are correlated with the thresholds for partial and full melting. We describe a semianalytic solution, based on an impulse-response function, for the response, to a heating pulse, of a thin film of good thermal conductor supported by an infinite substrate. The results agree well with the resistance measurements, and confirm our interpretation of the data. In addition, time-resolved reflectance measurements establish that, in this geometry, melting and solidification proceed via the motion of a well-defined, planar liquid/solid interface, whose position can be deduced from the resistance measurements. These measurements permit the first real-time determinations of melt-depths and quenching histories during rapid-solidification processing of metals.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 51: Symposium A – Beam-Solid Interactions and Phase Transformations , 1985 , 283
Copyright
Copyright © Materials Research Society 1985

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References

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