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Thin-Film Amorphous Silicon Dynodes for Electron Multiplication

Published online by Cambridge University Press:  25 February 2011

G.W. Tasker ,
J.R. Horton  and
J.J. Fijol
G.W. Tasker
Affiliation:
Galileo Electro-Optics Corp., Galileo Park, Sturbridge, MA 01566
J.R. Horton
Affiliation:
Galileo Electro-Optics Corp., Galileo Park, Sturbridge, MA 01566
J.J. Fijol
Affiliation:
Galileo Electro-Optics Corp., Galileo Park, Sturbridge, MA 01566
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Abstract

The design and fabrication of novel, thin-film continuous dynodes for a new generation of channel electron multipliers (CEMs) and microchannel plates (MCPs) are described. In particular, we demonstrate the feasibility of forming such dynodes by low pressure chemical vapor deposition (LPCVD) of amorphous Si films in capillary channels of macroscopic to microscopic dimensions. Finally, we discuss potential performance advantages of thin-film dynodes over conventional reduced lead silicate glass dynodes for CEMs and MCPs and implications for new applications.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 192: Symposium O – Amorphous Silicon Technology - 1990 , 1990 , 459
Copyright
Copyright © Materials Research Society 1990

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References

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