Hostname: page-component-745bb68f8f-hvd4g Total loading time: 0 Render date: 2025-01-26T10:12:25.475Z Has data issue: false hasContentIssue false
  • English
  • Français

Temperature dependence of magnetic and magnetotransport properties in BiFeO3 thin films by pulsed laser deposition

Published online by Cambridge University Press:  04 February 2014

P. Tiberto ,
G. Barrera ,
F. Celegato ,
M. Coïsson ,
P. Rizzi ,
F. Vinai ,
A.C. Garcia Castro ,
L. Salamanca-Riba ,
R.D. Vispute  and
F.J. Espinoza Beltran
...Show all authors
P. Tiberto
Affiliation:
INRIM, Electromagnetism Division strada delle Cacce 91, 10135 Torino (TO), Italy
G. Barrera
Affiliation:
INRIM, Electromagnetism Division strada delle Cacce 91, 10135 Torino (TO), Italy Università degli Studi di Torino, Dipartimento di Chimica, via P. Giuria 7, 10125 Torino (TO), Italy
F. Celegato
Affiliation:
INRIM, Electromagnetism Division strada delle Cacce 91, 10135 Torino (TO), Italy
M. Coïsson
Affiliation:
INRIM, Electromagnetism Division strada delle Cacce 91, 10135 Torino (TO), Italy
P. Rizzi
Affiliation:
Università degli Studi di Torino, Dipartimento di Chimica, via P. Giuria 7, 10125 Torino (TO), Italy
F. Vinai
Affiliation:
INRIM, Electromagnetism Division strada delle Cacce 91, 10135 Torino (TO), Italy
A.C. Garcia Castro
Affiliation:
Unidad Queretaro, Centro de Investigacion y Estudios Avanzados del IPN, Queretaro, Mexico
L. Salamanca-Riba
Affiliation:
Materials Science and Engineering Department, University of Maryland, Baltimore, Maryland, USA
R.D. Vispute
Affiliation:
Materials Science and Engineering Department, University of Maryland, Baltimore, Maryland, USA
F.J. Espinoza Beltran
Affiliation:
Unidad Queretaro, Centro de Investigacion y Estudios Avanzados del IPN, Queretaro, Mexico
J. Muñoz Sandaña
Affiliation:
Unidad Queretaro, Centro de Investigacion y Estudios Avanzados del IPN, Queretaro, Mexico
Get access

Abstract

Multiferroic BFO/SRO/Si trilayers have been prepared by pulsed laser deposition in the form of thin films. As a function of the BFO layer thickness, magnetic and magneto-transport properties have been investigated at room temperature and down to 5 K. At low BFO layer thickness, a residual γ-Fe2O3 phase, which interacts interfacially with the SRO and BFO layers, is responsible for moderately hard magnetic properties of the film. On increasing BFO layer thickness, more homogeneous deposits are obtained with uniform magnetic and magneto-resistive properties.

Keywords

filmmagneticBi
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1636: Symposium U – Magnetic Nanostructures and Spin-Electron-Lattice Phenomena in Functional Materials , 2014 , mrsf13-1636-u07-09
Copyright
Copyright © Materials Research Society 2014 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Binrk, C., He, X., Wang, Y., Sahoo, S., Christian Binek Publications 65 (2008) 1–9 Google Scholar
Fiebig, M., J. Phys. D 38 (2005) R123 CrossRefGoogle Scholar
Cheong, S.W., Mostovoy, M., Nature Mater. 6 (2007) 13 CrossRefGoogle Scholar
Ramesh, R., Spaldin, N.A., Nature Mater. 6 (2007) 21 CrossRefGoogle Scholar
Wang, J., Neaton, J.B., Zheng, H., Nagarja, V., Ogale, S.B., Liu, B., Viehland, D., Vaithyanathan, V., Schlom, D.G., Waghmare, U.V., Spaldin, N.A., Rabe, K.M., Wuittig, M., Ramesh, R., Science 299 (2003) 1719 CrossRefGoogle Scholar
Catalan, G., Scott, J.F., Adv. Mater. 21 (2009) 2463–2485 CrossRefGoogle Scholar
Sando, D., Agbelele, A., Rahmedov, D., Liu, J., Rovillain, P., Toulouse, C., Infante, I.C., Pyatakov, A.P., Fusil, S., Jacquet, E., Carrétéro, C., Deranlot, C., Lisenkov, S., Wang, D., Le Breton, J.-M., Cazayous, M., Sacuto, A., Juraszek, J., Zvezdin, A.K., Bellaiche, L., Dkhil, B., Barthélémy, A., Bibes, M., Nat. Mater. 12 (2013) 641–646 CrossRefGoogle Scholar
Naik, V.B., Mahendiran, R., Solid State Comm. 149 (2009) 754–758 CrossRefGoogle Scholar
Ravindran, P., Vidya, R., Kjejshusm, A. Fjellvag, H., Phys. Rev. B 74 /2006) 224412–224429 Google Scholar
Khomchenko, V.A., Kiselev, D.A., Kopcewicz, M., Maglione, M., Shvartsman, V.V., Borisov, P., Kleemann, W., Lopese, A.M.L., Pogorelov, Y.G., Araujo, J.P, Rubinger, R.M., Sobolev, N.A., Vieira, J.M., Kholkin, A.L., J. Magn. Magn. Mater. 321 (2009) 1692–1698 CrossRefGoogle Scholar
Béa, H., Bibes, M., Barthélémy, A., Bouzehouane, K. Jacquet, E., Khodan, A., Contour, J.-P., Fusil, S., Wyczisk, F., Forget, A., Lebeugle, D., Colson, D., Viret, M., Appl. Phys. Lett. 87 (2005) 072508 CrossRefGoogle Scholar
Ostos, C., Raymond, O., Almodovar, N. Suarez., Baqués, D. Bueno., Mestres, L., Siqueiros, J.M., J. Appl. Phys. 110 (2011) 024114 CrossRefGoogle Scholar
Choi, E.-Mi, Weal, E., Bi, Z., Wang, H., Kursumovic, A., Fix, T., Blamire, M.G., MacManus-Driscoll, J.L., Appl. Phys. Lett. 102 (2013) 012905 CrossRefGoogle Scholar
Wang, L., Wang, Z., Jin, K.-J., Li, J.-Q, Yang, H.-X., Wang, C., Zhao, R.-Q., Lu, H.-B., Guo, H.-Z., Yang, G.-Z., Appl. Phys. Lett. 102 (2013) 242902 CrossRefGoogle Scholar
Hussain, T., Siddiqi, S.A., Atiq, S., Awan, M.S., Progr. Nat. Sci.: Mater. Internat. 23 (2010) 487–492 CrossRefGoogle Scholar
Kiyama, T., Yoshimura, K., Kosuge, K., Phys. Rev. B 54 (1996) R756–R759 CrossRefGoogle Scholar
Lu, J., Günther, A., Schrettle, F., Mayr, F., Krohns, S, Lunkenheimer, P., Pimenov, A., Travkin, V.D., Mukhin, A.A., Loidl, A., Eur. Phys. J. B 75 (2010) 451–460 CrossRefGoogle Scholar
Greicius, S., Banys, J., Szafraniak-Wiza, I., Proc. Appl. Ceramics 3 (2009) 85–87 CrossRefGoogle Scholar
Zhu, H., Wang, S., Jiang, P., Shen, J., Tang, W., J. Kor. Phys. Soc. 57 (2010) 268–271 CrossRefGoogle Scholar
Lahmar, A., Habouti, S., Solterbeck, C.-H-, Es-Souni, N., Alouadi, B., J. Appl. Phys. 105 (2009) 014111 CrossRefGoogle Scholar
Zakharov, N.D., Satyalakshmi, K.M., Koren, G., Hesse, D., J. Mater. Res. 14 (1999) 4385–4394 CrossRefGoogle Scholar
Gautreau, O., Harnagea, C., Gunawan, L., Botton, G.A., Pintilie, L., Singh, M.P., Pignolet, A., J. Appl. Phys. 108 (2010) 114111 CrossRefGoogle Scholar