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Substrate Curvature Change Due to Morphological Instability of a Strained Epitaxial Surface Film

Published online by Cambridge University Press:  10 February 2011

F. Jonsdottir  and
L. B. Freund
F. Jonsdottir
Affiliation:
Hibbitt, Karlsson & Sorensen, Inc., 1080 Main Street, Pawtucket, RI 02860
L. B. Freund
Affiliation:
Division of Engineering, Brown University, Providence, RI 02912
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Abstract

The curvature induced in the substrate of a film-substrate system as a result of an epitaxial mismatch strain in a film of nonuniform thickness is considered. In particular, the change in curvature of the substrate due to a transition in film surface morphology from a fiat to a wavy profile is determined numerically. It is found that the amount of curvature relaxation accompanying the instability is within the resolution of recently refined substrate curvature measurement methodologies.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 441: Thin Films – Structure and Morphology , 1996 , 495
Copyright
Copyright © Materials Research Society 1997

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