Hostname: page-component-745bb68f8f-mzp66 Total loading time: 0 Render date: 2025-02-04T16:55:25.407Z Has data issue: false hasContentIssue false
  • English
  • Français

Silicon Thin Film Deposition on Nano-Structured ZnO Substrates

Published online by Cambridge University Press:  17 March 2011

R. Könenkamp ,
V. Chu ,
J. Conde  and
L. Dloczik
R. Könenkamp
Affiliation:
Hahn-Meitner Institut Berlin, Glienicker Str. 100, 14109 Berlin, Germany
V. Chu
Affiliation:
Instituto de Engenharia de Sistemas e Computadores, Rua Alves Redol 9, 1000-029 Lisbon
J. Conde
Affiliation:
Dept. of Materials Engineering, Instituto Superior Tecnico, Av. Rovisco Pais, 1049-001 Lisbon, Portugal
L. Dloczik
Affiliation:
Hahn-Meitner Institut Berlin, Glienicker Str. 100, 14109 Berlin, Germany
Get access

Abstract

Amorphous and micro-crystalline Si films have been deposited by the hot-wire technique on deeply structured columnar ZnO films. It is found that nearly perfect conformal deposition occurs for amorphous films, similar to what was previously found for rf-plasma deposited films. Micro-crystalline films deposited by the hot wire technique are less conformal since deposition occurs preferentially on protruding features of the substrate, while films deposited by rf-plasma CVD exhibit high conformality.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 664: Symposium A – Amorphous and Heterogeneous Silicon-Based Films-2001 , 2001 , A24.5
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

(1) Rost, C., Sieber, I., Siebentritt, S., Lux-Steiner, M. C., and Könenkamp, R., Appl. Phys. Lett. 75, 692 (1999)10.1063/1.124484Google Scholar
(2) Könenkamp, R., Boedecker, K., Lux-Steiner, M. C., Poschenrieder, M., Zenia, F., Levy-Clement, C. and Wagner, S., Appl. Phys. Lett. 77, 2575 (2000)Google Scholar
(3) Ernst, K., Lux-Steiner, M., and Könenkamp, R., Proceed. of the European Photovoltaic Science and Engineering Conference, Glasgow (2000)Google Scholar
(4) Condé, J. P., Brogueira, P., and Chu, V., Phil. Mag. B 76, 299 (1997)10.1080/01418639708241095Google Scholar
(5) Pauporte, T. and Lincot, D., Appl. Phys. Lett. 75, 3817 (1999)10.1063/1.125466Google Scholar
(6) Tsai, C. C., Knights, J. C., Chang, G. and Wacker, B., J. Appl. Phys. 59, 2998 (1986)Google Scholar
(7) Gallagher, A., J. Appl. Phys. 63, 2406 (1988)Google Scholar