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Room-Temperature Migration of Ion-Implanted Boron in Silicon

Published online by Cambridge University Press:  15 February 2011

E. J. H. Collait ,
K. Weemers ,
D. J. Gravesteijn ,
J. G. M. van Berkum  and
N. E. B. Cowern
E. J. H. Collait
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, the, Netherlands
K. Weemers
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, the, Netherlands
D. J. Gravesteijn
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, the, Netherlands
J. G. M. van Berkum
Affiliation:
Philips CFT-Materials Analysis, Prof. Holstlaan 4, 5656 AA Eindhoven, the, Netherlands
N. E. B. Cowern
Affiliation:
Philips Research Laboratories, Prof. Holstlaan 4, 5656 AA Eindhoven, the, Netherlands
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Abstract

Room temperature migration and clustering behaviour of implanted boron into silicon has been investigated by performing ion implantation of the 11B isotope into MBE-grown in-situ 10B-doped epitaxial Si-layers. We, for the first time, show that a fraction of the implanted boron migrates very deep into the bulk of the Si with substitutional 10B acting as trap centers for the migrating 11B.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 469: Symposium E – Defects and Diffusion in Silicon Processing , 1997 , 53
Copyright
Copyright © Materials Research Society 1997

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References

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