Hostname: page-component-745bb68f8f-5r2nc Total loading time: 0 Render date: 2025-02-10T12:54:50.704Z Has data issue: false hasContentIssue false
  • English
  • Français

The Relationship Between Emission Spectroscopy and Optical Properties of Amorphous Carbon Films

Published online by Cambridge University Press:  25 February 2011

Richard M. Roth  and
Richard H. Jarman
Richard M. Roth
Affiliation:
Amoco Corporation, Corporate Research, P.O. Box 400, Naperville, IL 60566
Richard H. Jarman
Affiliation:
Amoco Corporation, Corporate Research, P.O. Box 400, Naperville, IL 60566
Get access

Abstract

Emission from CH and H radicals was monitored during the deposition of amorphous carbon films in a capacitively coupled rf glow discharge. Both the spectral and spatial distributions of the emission were studied. The relative intensity of the CH and H emission was found to be sensitive to changes in discharge parameters. Preliminary results indicate a correlation between the ratios of the CH to H emission intensities and the optical properties of the deposited films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 98: Symposium K – Plasma Processing and Synthesis of Materials II , 1987 , 327
Copyright
Copyright © Materials Research Society 1987

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Lamb, J. D. and Woollam, J. A., J. Appl. Phys. 57, 5420 (1985).Google Scholar
2. Dischler, B., Bubenzer, A., and Koidl, P., Solid State Commun. 48, 105 (1983).Google Scholar
3. Nishikawa, S., Kakinuma, H., Fukuda, H., Watanabe, T., and Nihei, K., Jpn. J. Appl. Phys. 25, 511 (1986).Google Scholar
4. Bubenzer, A., Dischler, B., and Nyaiesh, A., Thin Solid Films 91, 81 (1982).Google Scholar
5. Enke, K., Appl. Optics 24, 508 (1985).Google Scholar
6. Pellicori, S. F., Peterson, C. M., and Henson, T. P., J. Vac. Sci. Technol. A 4, 2350 (1986).Google Scholar
7. Warner, J. D., Pouch, J. J., Alterovitz, S. A., Liu, D. C., and Lanford, W. A., J. Vac. Sci. Technol. A 3, 900 (1985).Google Scholar
8. Wagner, J. and Lautenschlager, P., J. Appl. Phys. 59, 2044 (1986).Google Scholar
9. Ojha, S. M., Norstrom, H., and McCulluch, D., Thin Solid Films 64, 213 (1979).Google Scholar
10. Fink, J., Muller-Heinzerling, Th., Pfluger, J., Scheerer, B., Dischler, B., Koidl, P., Bubenzer, A., and Sah, R. E., Phys. Rev. B 30, 4713 (1984).Google Scholar
11. Kobayashi, K., Mutsukura, N., and Machi, Y., J. Appl. Phys. 59, 910 (1986).Google Scholar
12. Wagner, J., Wild, Ch., Pohl, F., and Koidl, P., Appl. Phys. Lett. 48, 106 (1986).Google Scholar
13. Andersson, L. P., Berg, S., Norstrom, H., Olaison, R., and Towta, S., Thin Solid Films 63, L55 (1979).Google Scholar
14. Kampas, F. J., Mat. Res. Soc. Symp. Proc. 38, 85 (1985).Google Scholar
15. Roth, R. M., paper in this symposia proceedings.Google Scholar
16. Swanepoel, R., J. Phys. D: Appl. Phys. 16, 1214 (1983).Google Scholar
17. Tauc, J., Grigorovic, R., and Vancu, A., Phys. Status Solidi 15, 627 (1966).Google Scholar
18. Aarts, J. F. M., Beenakker, C. I. M., and de Heer, F. J., Physica 53, 32 (1971).Google Scholar
19. Kohler, K., Coburn, J. W., Horne, D. E., Kay, E., and Keller, J. H., J. Appl. Phys. 57, 59 (1985).Google Scholar