Hostname: page-component-54dcc4c588-dbm8p Total loading time: 0 Render date: 2025-09-12T06:58:56.735Z Has data issue: false hasContentIssue false
  • English
  • Français

Reducing Intergranular Magnetic Coupling by Incorporating Carbon into Co/Pd Multilayers

Published online by Cambridge University Press:  15 February 2011

Wenhong Liu ,
Jonathan Morris ,
Alex Payne  and
Bruce Lairson
Wenhong Liu
Affiliation:
Materials Science and Engineering, Rice University, Houston, TX 77251
Jonathan Morris
Affiliation:
Materials Science and Engineering, Rice University, Houston, TX 77251
Alex Payne
Affiliation:
Censtor Corporation, San Jose, CA 95126
Bruce Lairson
Affiliation:
Materials Science and Engineering, Rice University, Houston, TX 77251
Get access

Abstract

The ideal magnetic switching mechanism for many types of data storage, including hard disk recording, is isolated domain coherent rotation (Stoner-Wohlfarth switching). However, in typical Pd/Co multilayers with high coercivity, the dominant switching mechanism is domain wall motion, which causes noise in the read back signal. We show that the proper addition of elements, such as carbon, into Pd/Co multilayers reduces the coupling between adjacent magnetic domains. The reduction of magnetic coupling reduces the length scale over which incoherent switching occurs.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 384: Symposium L – Magnetic Ultrathin films, Multilayers and Surfaces , 1995 , 189
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

REFERENCES

1. Lairson, B.M., Perez, J.P. and Baldwin, C., Appl. Phys. Lett. 64, 23 (1994).Google Scholar
2. Lairson, B.M., Liu, W., Payne, A.P., Baldwin, C. and Hamilton, H., J. Appl. Phys. June, 1995.Google Scholar
3. Thin Film Processes II, edited by Vossen, J.L., Kerm, W. (Academic Press, Boston, 1991) p. 758.Google Scholar
4. Bennett, W.R., England, C.D., Person, D.C., and Falco, C.M., J. Appl. Phys. 69, 4384 (1991).Google Scholar
5. Suna, A., J. Appl. Phys. 59, 313 (1986)Google Scholar
6. Shtrikman, S. and Treves, D., J. de Phys. et Rad., 20, 286 (1959).Google Scholar
7. Kelly, P.E., O'Grady, K., Mayo, P.I. and Chantrell, R.W., IEEE Trans. Magn., 25, 3881 (1989).Google Scholar
8. Wohlfarth, E.P., J. Appl. Phys., 29, 595 (1958).Google Scholar