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Pulsed Laser Deposition of Poly(Tetrafluoroethylene) Films

Published online by Cambridge University Press:  15 February 2011

D.L. Kjendal ,
Ashok Kumar ,
R.B. Inturi  and
J. A. Barnard
D.L. Kjendal
Affiliation:
Department of Electrical Engineering, University of South Alabama, Mobile, AL 36688
Ashok Kumar
Affiliation:
Department of Electrical Engineering, University of South Alabama, Mobile, AL 36688
R.B. Inturi
Affiliation:
Department of Metallurgical and Materials Engineering and the Center for Materials Information Technology, University of Alabama, Tuscaloosa, AL 35487-0202
J. A. Barnard
Affiliation:
Department of Metallurgical and Materials Engineering and the Center for Materials Information Technology, University of Alabama, Tuscaloosa, AL 35487-0202
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Abstract

Thin films of poly(tetrafluoroethylene) have been deposited on amorphous (7059 Corning Glass) and silicon(l00) substrates at various temperatures by the Pulsed Laser Deposition technique. The deposition was carried out at high vacuum (˜10-6 torr)at temperatures ranging from room temperature to 350°C. The mechanical properties of these films at the varying process temperatures have been evaluated by nano-indentation techniques and compositional properties of the films have been characterized by Fourier Transform Infrared spectroscopy. The deposition parameters have been optimized in order to produce good quality films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 397: Symposium B – Advanced laser Processing of Materials-Fundamentals and Applications , 1995 , 223
Copyright
Copyright © Materials Research Society 1996

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References

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