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Pulsed DC Reactive Magnetron Sputtering of AlN Thin Films on High Frequency LTCC Substrates

Published online by Cambridge University Press:  01 February 2011

Jung W. Lee ,
Jerome J. Cuomo ,
Baxter F. Moody ,
Yong S. Cho  and
Roupen L. Keusseyan
Jung W. Lee
Affiliation:
Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695, USA
Jerome J. Cuomo
Affiliation:
Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695, USA
Baxter F. Moody
Affiliation:
Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695, USA
Yong S. Cho
Affiliation:
DuPont Electronic Technologies, Research Triangle Park, NC 27709, USA
Roupen L. Keusseyan
Affiliation:
DuPont Electronic Technologies, Research Triangle Park, NC 27709, USA
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Abstract

This preliminary work reports the preparation of AlN thin films on an LTCC (low temperature co-fired ceramics) substrate by pulsed dc reactive magnetron sputtering and the limited characterization focusing on microstructure and crystal orientation. The main focus will be placed on the effects of changing pulsed frequency. The AlN thin film showed good adhesion with the substrate and columnar structures having small grains regardless of pulsed frequency. The crystal orientation of AlN thin films was dependent on pulsed frequency according to the result of XRD patterns. The preferred (002) orientation was obtained at a pulsed frequency of 100 kHz. The broad band of 300 to 650 nm observed in photoluminescence spectrum was believed due to defects associated with the presence of oxygen impurities.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 783: Symposium B – Materials, Intergration, and Packaging Issues for High-Frequency Devices , 2003 , B5.10
Copyright
Copyright © Materials Research Society 2004

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References

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