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Preparation of Phenylsiloxane Films VIA Solution Deposition Techniques

Published online by Cambridge University Press:  28 February 2011

E.W. Burkhardt ,
R.R. Burford  and
J.H. Deatcher
E.W. Burkhardt
Affiliation:
Akzo Chemicals Inc., Livingstone Ave., Dobbs Ferry, NY 10522
R.R. Burford
Affiliation:
Chisholm Institute of Technology, Department of Chemistry, East Caulfield, Victoria, Australia, 3145
J.H. Deatcher
Affiliation:
Akzo Chemicals Inc., Livingstone Ave., Dobbs Ferry, NY 10522
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Abstract

Thin films (1–10μ thick) can be spin coated on a variety of substrates from formulations containing polyphenylsiloxanes and alkylsilicates. These films may be cured either thermally or photochemically, yielding films with good adherence to the substrate. The combination of photolysis and thermolysis results in changes in the film hardness characteristics. The use of a mask during photocuring results in films which may be developed in either a positive or negative fashion. The preparation of various formulations along with film curing processes will be discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 180: Symposium A – Better Ceramics Through Chemistry IV , 1990 , 767
Copyright
Copyright © Materials Research Society 1990

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References

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