Published online by Cambridge University Press: 25 February 2011
PbTiO3 and PbZrO3 thin films were successfully fabricated from oxide multilayers by employing ion-assisted deposition process (IAD). Excellent control of the film thickness and composition were achieved by using the multilayer deposition technique. A (001)-oriented phase was found in the PbTiO3 films at 550°C with 300 and 600eV Ar+ ion bombardment. Very fine equiaxial grain size of 0.2μm was seen in the IAD deposited PbTiO3 films, which is independent of the Ar+ ion beam energy. The optical properties of the PbTiO3 films were studied for different energies of Ar+ ion beam and for various post-deposition annealing temperatures. PbTiO3 films with packing density of near unity (≅0.99) were obtained at temperatures as low as 600°C.