Published online by Cambridge University Press: 17 March 2011
This contribution presents an approch to use wire-like substrates for thin-film devices. Based on plasma deposition processes for metals, hydrogenated amorphous silicon (a-Si:H) and transparent conductive oxides, solar cells are fabricated onto metal wires coated by a dielectric. Photolithography using a N2-laser and etching steps serve to pattern the thin film layers. Scanning electron microscope pictures and current-voltage characteristics of the device are demonstrated. Simple geometric simulations show the spectrally resolved intensity of the light that is scattered into the a-Si:H layers as a function of the diameter ratio of the substrate material and the deposited thin films. Finally, we discuss light concentrating and light trapping designs of sensors on transparent fibre substrates.