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Photoinduced Low Refractive Index Patterning in a Photosensitive Hybrid Material

Published online by Cambridge University Press:  15 February 2011

Jang-Ung Park ,
Eun-Seok Kang  and
Byeong-Soo Bae
Jang-Ung Park
Affiliation:
Laboratory of Optical Materials and Coating, Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305-701, Republic of Korea, e-mail:bsbae@mail.kaist.ac.kr
Eun-Seok Kang
Affiliation:
Laboratory of Optical Materials and Coating, Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305-701, Republic of Korea, e-mail:bsbae@mail.kaist.ac.kr
Byeong-Soo Bae
Affiliation:
Laboratory of Optical Materials and Coating, Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 305-701, Republic of Korea, e-mail:bsbae@mail.kaist.ac.kr
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Abstract

Light illumination processing created photoinduced reduction of refractive index as well as volume contraction in an organic-inorganic hybrid material. Whereas both refractive index and film thickness are decreased significantly by the light exposure, transmittance and anti-soiling property of the hybrid film are not affected by the exposure. Direct patterning is possible upon light illumination using the photoinduced change in thickness without any developing process.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 780: Symposium Y – Advanced Optical Processing of Materials , 2003 , Y3.7
Copyright
Copyright © Materials Research Society 2003

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References

references

1. Klein, L., Sol-Gel Optics, Processing and Applications (Kluwer Academic Publishers, Dordrecht, 1994).Google Scholar
2. Popall, M., Dabek, A., and Robertsson, M. E., et al, Mol. Cryst. and Liq. Cryst., 354, 123 (2000).Google Scholar
3. Popall, M., Buestrich, R., and Kahlenberg, F., et al., Mat. Res. Soc. Symp. Proc., 621, CC9.4.1 (2000).Google Scholar
4. Blanc, D., Pelissier, S., Saravanamuttu, K., Najafi, S. I., and Andrews, M. P., Adv. Mater. 11, 1508 (1999).Google Scholar
5. Gombert, A., Glaubitt, W., Rose, K., and Wittwer, V., et al, Thin Solid Films, 351, 73 (1999).Google Scholar
6. Clough, R. L., Radiation Effects on Polymers (American Chemical Society symposium series 475, Washington, 1991), 156–192.Google Scholar
7. Park, J. U., Kim, W. S., and Bae, B. S., J. Mater. Chem., 13, 738 (2003).Google Scholar
8. Clarson, S. J., and Semyen, J. A., Siloxane Polymers (PTR Prentice Hall, Inc., New Jersey, 1993), 327–332.Google Scholar