Hostname: page-component-745bb68f8f-kw2vx Total loading time: 0 Render date: 2025-01-27T13:25:07.591Z Has data issue: false hasContentIssue false
  • English
  • Français

Pattern Evolution of Self-Assembled Quantum Dots Under Biaxial Stresses

Published online by Cambridge University Press:  01 February 2011

Yaoyu Pang  and
Rui Huang
Yaoyu Pang
Affiliation:
steven_pang@mail.utexas.eduUniversity of TexasDepartment of Aerospace Engineering and Engineering MechanicsAustin TX 78712United States
Rui Huang
Affiliation:
ruihuang@mail.utexas.edu, University of Texas, Department of Aerospace Engineering and Engineering Mechanics, Austin, TX, 78712, United States
Get access

Abstract

A stressed epitaxial film can undergo surface instability. The stress field and the interface interaction have profound effects on the dynamics of surface evolution that leads to self-assembled quantum dots. In this paper, by using a nonlinear evolution equation, we investigate pattern evolution of self-assembled quantum dots under general biaxial stresses. It is found that the shape of quantum dots and their spatial ordering are strongly influenced by the relative magnitudes of the biaxial stresses. Linear perturbation analysis and nonlinear numerical simulations are conducted to elucidate the effect of stress anisotropy on the process of self-assembly that selects different patterns.

Keywords

self-assemblyfilmmorphology
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 921: Symposium T – Nanomanufacturing , 2006 , 0921-T07-08
Copyright
Copyright © Materials Research Society 2006

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Asaro, R.J. and Tiller, W.A., Metall. Trans. 3, 1789–1796 (1972).Google Scholar
2. Grinfeld, M.A., Sov. Phys. Dokl. 31, 831–834 (1986).Google Scholar
3. Srolovitz, D.J., Acta Metall. 37, 621–625 (1989).Google Scholar
4. Savina, T.V., Voorhees, P.W., and Davis, S.H., J. Appl. Phys. 96, 3127–3133 (2004).Google Scholar
5. Pang, Y. and Huang, R., submitted (2005). Preprint available at http://www.ae.utexas.edu/~ruihuang/.Google Scholar
6. Zhang, Y.W., Phys. Rev. B 61, 10388–10392 (2000).Google Scholar
7.S.Gill, P.A., Thin Solid Films 423, 136–145 (2003).Google Scholar
8. Berger, P., Kohlert, P., Kassner, K., Misbah, C., Phys. Rev. Lett. 90, 176103 (2003).Google Scholar
9. Paret, J., Phys. Rev. E 72, 011105 (2005).Google Scholar
10. Spencer, B.J., Phys. Rev. B 59, 2011–2017 (1999).Google Scholar
11. Ogino, T., et al., Surface Science 514, 1–9 (2002).Google Scholar
12. Hupalo, M. and Tringides, M.C., Phys. Rev. B 73, 041405 (2006).Google Scholar
13. Chen, Y., et al., Appl. Phys. Lett. 76, 4004–4006 (2000).Google Scholar