Hostname: page-component-745bb68f8f-5r2nc Total loading time: 0 Render date: 2025-02-05T15:26:18.507Z Has data issue: false hasContentIssue false
  • English
  • Français

Ozone Cleaning of Carbon-related Contaminants on Si Wafers and other Substrate Materials

Published online by Cambridge University Press:  10 February 2011

H. Nonaka ,
A. Kurokawa ,
S. Ichimura  and
D. W. Moon
H. Nonaka
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305 Japan, e8610@etl.go.jp
A. Kurokawa
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305 Japan, e8610@etl.go.jp
S. Ichimura
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305 Japan, e8610@etl.go.jp
D. W. Moon
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba, Ibaraki 305 Japan, e8610@etl.go.jp KRISS, Yusong, Taejon 305-600, Korea
Get access

Abstract

We have investigated a novel surface cleaning technique of native oxide on Si wafer, in which carbon-related contaminants are removed effectively at room temperature with a pure ozone beam from an ozone jet generator that we developed. Although ozone alone was likely to be little reactive to saturated carbons and byproducts in the reaction of ozone with unsaturated carbons which could be assigned to either carbonyl- or carboxyl-related compounds, a high-dose pure ozone under ultraviolet light irradiation to generate atomic oxygen by the photo-dissociation of ozone removed most of them at room temperature. The effectiveness of the ozone cleaning was also demonstrated for selected oxide surfaces.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 477 , 1997 , 493
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Hosokawa, S. and Ichimura, S., Rev. Sci. Instrum. 62, 1614 (1991).10.1063/1.1142440CrossRefGoogle Scholar
2. Nonaka, H., Shimizu, T., Hosokawa, S., Ichimura, S., and Arai, K., Surf. Interface Anal. 19, 353 (1992).10.1002/sia.740190166CrossRefGoogle Scholar
3. Ichimiya, A. and Takeuchi, Y., Surf Sci. 128, 343 (1983).CrossRefGoogle Scholar
4. Nonaka, H., Shimizu, T., Ichimura, S., and Arai, K., J. Vac. Sci. Technol. A11, 2676 (1993).10.1116/1.578625CrossRefGoogle Scholar
5. Okabe, H., Photochemistry of Small Molecules,, (John Wiley & Sons, 1978), p.241.Google Scholar
6. Shimizu, T., Nonaka, H., and Arai, K., J. Cryst. Growth, 128, 793, (1993).10.1016/S0022-0248(07)80046-7CrossRefGoogle Scholar
7. Muilenberg, G.E. (ed.) Handbook of X-ray photoelectron spectroscopy,, (Perkin-Elmer Corp., MN 1979), p.38.Google Scholar
8. Horváth, M., Bilitzky, L., and Hüttner, J., Ozone, (Elsevier Science Publishers, 1985), p.50. (thermal decomposition of ozone oxygen does not occur at room temperature and a possibility of reaction between saturated carbons and atomic oxygen as a product of the decomposition of ozone is, therefore, excluded. ref. Handbook of X-ray photoelectron spectroscopy, (Perkin-Elmer Corp., MN 1979), p.38 p.37)Google Scholar
9. Moon, D.W., Kurokawa, A., and Ichimura, S., to be published.Google Scholar