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Organic Insulating Films at Nanometer Scale

Published online by Cambridge University Press:  10 February 2011

D. Vuillaume
D. Vuillaume*
Affiliation:
Institut d'Electronique et de Micro-électronique du Nord, CNRS, and Dept. of Physics at ISEN, BP69, F-59650 cedex, Villeneuve d'Ascq, France, vuillaume@isen.iemn.univ-lillel.fr
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Abstract

We discuss the electrical and photo-electrical properties of monolayers of long hydrocarbon chains (alkyltrichlorosilane molecules) self-assembled on a silicon substrate. It is shown that these monolayers (<3 nm thick) act as high quality insulators : DC conductivity through the monolayers are in the 10-15 S/cm range, energy barrier heights at the silicon/monolayer interface are in the 45 eV range. Chemical surface modifications of these monolayers are reported in order to tailor their surface as well as electrical (dielectric constant) properties. Possible sub-01 μηι device applications are presented.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 446: Amorphous and Crystalline Insulating Thin Films–1996 , 1996 , 79
Copyright
Copyright © Materials Research Society 1997

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References

1 Schuegraf, K., King, C., and Hu, C., Symp. on VLSI Technology Technical Digest, (1992), p. 18 Google Scholar
2 Depas, M., Van Meirhaegue, R.L., Laflère, W.H., and Cardon, F., Solid State Electron. 37, 433 (1994).Google Scholar
3 Tanguy, J., Thin Solid Films 13, 33 (1972).Google Scholar
4 Mann, B. and Kuhn, H., J. Appl. Phys. 42, 4398 (1971).Google Scholar
5 Polymeropoulos, E.E. and Sagiv, J., J. Chem. Phys. 69, 1836 (1978); E.E Polymeropoulos, J. Appl. Phys. 48, 2404 (1977).Google Scholar
6 Couch, N.R., CM. Montgomery and R. Jones, Thin Solid Films 135, 173 (1986).Google Scholar
7 Petty, MC. and Barlow, WA. in Langmuir-Blodgett Films, edited by Roberts, G., Plenum Press, New York, 1990, pp. 93–132 Google Scholar
8 Brzoska, J.-B., Shahidzadeh, N. and Rondelez, F., Nature 360, 719 (1992); J.-B. Brzoska, I. Ben Azouz and F. Rondelez, Langmuir 10, 4367 (1994).Google Scholar
9 Boulas, C., Davidovits, J.V, Rondelez, F. and Vuillaume, D., Phys. Rev. Lett. 76, 4797 (1996).Google Scholar
10 Vuillaume, D., Boulas, C., Collet, J., Davidovits, J.V. and Rondelez, F., Appl. Phys. Lett 69, 1646 (1996).Google Scholar
11 Zisman, W., Adv. Chem. Ser. 43, 1 (1964); R. Maoz and J. Sagiv, J. Colloid Interf. Sei. 100, 465 (1984).Google Scholar
12 Saoudi, R., Hollinger, G., Gagnaire, A., Ferret, P. and Pitival, M., J. Phys. Ill 3, 1479 (1993).Google Scholar
13 Parikh, A.N., Aliara, D.L., and Rondelez, F., Langmuir 11, 2357 (1995).Google Scholar
14 Parikh, A.N., Aliara, D.L., Azouz, IB., and Rondelez, F., J. Phys. Chem. 98, 7577 (1994).Google Scholar
15 In the calculation of the SAM thickness, we have used a value of 150 for the SAM refractive index at 633 nm for the close packed SAMs (see Refs. 13 and 14). The optical functions of the oxidized substrate have been independently determined by measuring a bare wafer cleaned by rigourously the same surface cleaning process.Google Scholar
16 Wassermam, S.R., To, Y.T. and Whitesides, G.M., Langmuir 5, 1074 (1989).Google Scholar
17 Fontaine, P., Goguenheim, D., Deresmes, D., Vuillaume, D., Garet, M., and Rondelez, F., Appl. Phys. Lett 62, 2256 (1993).Google Scholar
18 Powell, R.J., J. Appl. Phys. 41, 2424 (1970).Google Scholar
19 Tredgold, R.H. and Winter, C.S., J. Phys. D 14, L185 (1981).Google Scholar
20 Simmons, J.G., J. Appl. Phys. 34, 1793 (1964).Google Scholar
21 Delerue, C., Allan, G. and Vuillaume, D., manuscript in preparation.Google Scholar
22 Less, K.J. and Wilson, E.G., J. Phys. C: Solid State Physics 6, 3110 (1973).Google Scholar
23 Peterson, I.R., J. Chim. Physique 85, 997 (1988).Google Scholar
24 Jin, Z.H. et al. , Langmuir 10, 2662 (1994).Google Scholar
25 Vuillaume, D. et al. , manuscript in preparationGoogle Scholar
26 Davidovits, J.V., Pho, V., Silberzan, P. and Goldmann, M., Surf. Sei. 352–354, 369 (1996).Google Scholar
27 Jung, DR. and Czanderna, A.W., Critical Reviews in Solid State and Materials Sciences 19, 1 (1994).Google Scholar
28 Fischer, CM., Burghard, M., Roth, S. and Klitzing, K. v., Appl. Phys. Lett. 66, 3331 (1995).Google Scholar
29 Rondelez, F., private communication.Google Scholar
30 Ulman, A. in An introduction to ultrathin organic films. From Langmuir-Blodgett to self-assembly. Academic Press, San Diego, 1991 Google Scholar
31 Collet, J., Bonnier, M., Bouloussa, O., Rondelez, F. and Vuillaume, D., presented at European Conference on Molecular Electronics (Leuven, Belgium, Sept. 1996), unpublished; ibid, European Conference on Organized Films (Sheffield, UK, Sept. 1996), unpublished.Google Scholar
32 Lercel, M.J. et al. , J. Vac. Sei. Technol. Bll, 2823 (1993); M.J. Lercel et al., Appl. Phys. Lett. 68, 1504(1996).Google Scholar