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Near-Surface Leaching Studies of Pb-Implanted Savannah River Waste Glass

Published online by Cambridge University Press:  15 February 2011

G. W. Arnold ,
C. J. M. Northrup  and
N. E. Bibler
G. W. Arnold
Affiliation:
Sandia National Laboratories, Albuquerque, NM, 87185, USA
C. J. M. Northrup
Affiliation:
Sandia National Laboratories, Albuquerque, NM, 87185, USA
N. E. Bibler
Affiliation:
E. I. DuPont de Nemours and Company, Savannah River Laboratory, Aiken, SC, 29801, USA
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Extract

Ion implantation into simulated nuclear waste glasses is a rapid means of producing near-surface energy deposition similar to that produced by α-recoil nuclei after long storage times (typically 103 – 106 years). For example, Dran, Maurette, and Petit1 used 200 keV Pb-ion implantations in glass at a fluence of 5 × 1012/cm2 to produce surface damage. This fluence is equivalent to approximately 2 × 1018 alpha-decays/cm3 which corresponds to approximately 106 years storage for glass containing Savannah River Plant (SRP) defense high-level waste (DHLW). These authors1 found that this fluence value corresponded to a critical fluence (Φc) for enhanced etching (a factor of 20 increase as inferred by step-height changes) for several silicate glasses when etched in a NaCl solution at 100°C. This critical fluence value also corresponds very well with the fluence at which significant overlap of individual ion tracks occurs.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 11: Symposium – Scientific Basis for Nuclear Waste Management V , 1981 , 357
Copyright
Copyright © Materials Research Society 1982

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References

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