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Multispectral Spectroscopic Ellipsometry-A New Tool for In Situ Surface Analysis

Published online by Cambridge University Press:  26 February 2011

F. Ferrjeu ,
J.L. Stehle ,
F. Bernoux  and
O. Thomas
F. Ferrjeu
Affiliation:
CNET Centre Narional d'Etudes des Telecommunications Meylan-Cedex,Chemin du vieux Chene,BP.98–38243,France.
J.L. Stehle
Affiliation:
CNET Centre Narional d'Etudes des Telecommunications Meylan-Cedex,Chemin du vieux Chene,BP.98–38243,France.
F. Bernoux
Affiliation:
CNET Centre Narional d'Etudes des Telecommunications Meylan-Cedex,Chemin du vieux Chene,BP.98–38243,France.
O. Thomas
Affiliation:
SOPRA,68 rue Pierre Joigneaux-92270 Bois Colombes,France.
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Abstract

Spectroscopie ellipsometry is a non-destructive tool for physical characterization without prior preparation of materials.Real time, in-situ measurements can be applied to analyze surface problems, to optimize thin film processing and even to monitor epitaxial growth or thin film deposition. Spectroscopie Eilipsometers built by SOPRA are described. A new instrument using Optical Multi-channel Analysis,(OMA), with a spectral range from 1.1 ev up to 4.8 ev which gives up to 11 ellipsometry spectra per second has been developed. Applications using Spectroscopie Ellipsometry are also discussed .

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 101: Symposium B – Laser and Particle-Beam Chemical Processing for Microelectronics , 1987 , 403
Copyright
Copyright © Materials Research Society 1998

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References

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