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Modification of The Near-Surface Region Of Al2O3 By Ion Implantation*

Published online by Cambridge University Press:  21 February 2011

C. W. White ,
G. C. Farlow ,
H. Naramoto ,
C. J. Mchargue  and
B. R. Appleton
C. W. White
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831
G. C. Farlow
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831
H. Naramoto
Affiliation:
JAERI, Tokai-mura, Japan
C. J. Mchargue
Affiliation:
Metals and Ceramics Division, ORNL
B. R. Appleton
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831
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Abstract

Physical and structural property changes resulting from ion implantation and thermal annealing of α-A12O3 are reviewed. Emphasis is placed on damage production during implantation, damage recovery during thermal annealing, and impurity incorporation during thermal annealing. Physical and structural property changes caused by ion implantation and annealing are correlated with changes in the mechanical properties.

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Footnotes

*

Research sponsored by the Division of Materials Sciences, U. S. Department of Energy under contract W-7405-eng-26 with Union Carbide Corporation.

References

REFERENCES

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