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Modelling and Measurements of the Thermal Diffusivity of Diamond Thin Film Samples

Published online by Cambridge University Press:  25 February 2011

Tan Hong Siang ,
Hui Ping ,
Jaeshin Ahn  and
Tan Fong Hock
Tan Hong Siang
Affiliation:
Nanyang Technological University, School of Electrical & Electronic Engineering, Singapore 2263
Hui Ping
Affiliation:
Nanyang Technological University, School of Electrical & Electronic Engineering, Singapore 2263
Jaeshin Ahn
Affiliation:
Nanyang Technological University, School of Electrical & Electronic Engineering, Singapore 2263
Tan Fong Hock
Affiliation:
Nanyang Technological University, School of Electrical & Electronic Engineering, Singapore 2263
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Abstract

A new method for the modelling and measurement of the thermal diffusivity of very thin films is proposed, and is applied to diamond thin film samples grown by chemical vapor deposition using a mixture of methane and hydrogen. This method is based on a two-dimensional model of the heat conduction process in a thin film to which a delta-function heat pulse is applied as a line source. The mathematical solution is specialized to obtain expressions for the temperature pulse propagating through the plane of the film. With suitable approximations, it is shown that the thermal diffusivity of the film can be deduced directly from a measurement of the temperature excursion with time at various points on the films. The advantages and difficulties of the measurement using this method will be discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 270: Symposium M – Novel Forms of Carbon , 1992 , 443
Copyright
Copyright © Materials Research Society 1992

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References

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