Hostname: page-component-745bb68f8f-kw2vx Total loading time: 0 Render date: 2025-02-10T12:04:16.587Z Has data issue: false hasContentIssue false
  • English
  • Français

Microstructures in thin BaTiO3 Films by Hydrothermal Method

Published online by Cambridge University Press:  10 February 2011

T. Hoffmann  and
V. M. Fuenzalida
T. Hoffmann
Affiliation:
Departamento de Fisica, Universidad de Chile, Casilla 487–3, Santiago, Chile
V. M. Fuenzalida
Affiliation:
Departamento de Fisica, Universidad de Chile, Casilla 487–3, Santiago, Chile
Get access

Abstract

Barium titanate microstructures are fabricated on silicon(100)/platinum substrates coated with photoresist and titanium by a combination of hydrothermal and lift-off techniques. The microstructures of 10μm width are well defined. The barium titanate films grow in its cubic phase. Analysis by means of x-ray diffraction and scanning electron microscopy shows that only a part of the titanium layer is affected by the hydrothermal reaction. This limitation may be overcome by application of electrochemistry.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 495: Symposium W – Chemical Aspects of Electronic Ceramics Processing , 1997 , 451
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Scott, J.F., Ross, F.M., Paz de Araujo, C.A., Scott, M.C., and Huffinan, M., MRS Bulletin, 21(7), 33 (1996).Google Scholar
2. Kingon, A.I., Streiffer, S.K., Basceri, C., and Summerfelt, S.R., MRS Bulletin, 21(7), 46 (1996).Google Scholar
3. Fork, D.K., Armani-Leplingrad, F., and Kingston, J.J., MRS Bulletin, 21(7), 53 (1996).Google Scholar
4. Polla, D.L., and Francis, L.F., MRS Bulletin, 21(7), 59 (1996).Google Scholar
5. Yoshimura, M., Yoo, S.E., Hayashi, M., and Ishizawa, N., Jpn. J. Appl. Phys., 28(11), L2007 (1989).Google Scholar
6. Bacsa, R.R., Rutsch, G., and Dougherty, J.P., J. Mater. Res., 11(1), 194 (1996).Google Scholar
7. Venigalla, S., Bendale, P., and Adair, J.H., J. Electrochem. Soc., 142(6) 2101 (1995).Google Scholar
8.see MRS Bulletin 21(6) 21–58 (1996): Electroceramic thin films. Part I: Processing.Google Scholar
9. Pilleux, M.E., and Fuenzalida, V.M., J. Appl. Phys., 74[7], 4664 (1993).Google Scholar
10. Bacsa, R.R, Dougherty, J.P., and Pilione, L.J., Appl. phys. Lett., 63(8), 1053 (1993).Google Scholar
11. Shi, E., Cho, C.R., Jang, M.S., Jeong, S.Y., and Kim, H., J. Mater. Res., 9(11) 2914 (1994).Google Scholar
12. Cho, C.R., Shi, E., Jang, M.S., Jeong, S.Y., and Kim, S.C., Jpn. J. Appl. Phys., 33, 4984 (1994).Google Scholar
13. Xu, W., Zheng, L., Lin, C., and Okuyama, M., J. Electrochem. Soc., 143(3), 1133 (1996).Google Scholar