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Microstructural Development of TiB2 Ion Implanted with 1 Mev Nickel*

Published online by Cambridge University Press:  25 February 2011

P. S. Sklad ,
P. Angelini ,
M. B. Lewis  and
C. J. Mchargue
P. S. Sklad
Affiliation:
Metals and Ceramics Division Oak Ridge National Laboratory, Post Office Box X, Oak Ridge, TN 37831
P. Angelini
Affiliation:
Metals and Ceramics Division Oak Ridge National Laboratory, Post Office Box X, Oak Ridge, TN 37831
M. B. Lewis
Affiliation:
Metals and Ceramics Division Oak Ridge National Laboratory, Post Office Box X, Oak Ridge, TN 37831
C. J. Mchargue
Affiliation:
Metals and Ceramics Division Oak Ridge National Laboratory, Post Office Box X, Oak Ridge, TN 37831
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Abstract

An Analytical Electron Microscopy (AEM) investigation of polycrystalline TiB2 implanted with 1 MeV Ni+ to 1 × 1021 ions/m2 has shown that the implanted region remained crystalline and showed no evidence of precipitation. A region containing tangled dislocations extended from the implanted surface to ∼500 nm. Between ∼500 and 750 nm, the microstructure was more complicated and could be indicative of a high density of 5 to 10 nm diam defects. The maximum nickel concentration determined by energy dispersive spectroscopy (EDS) occurred at ∼450 nm, slightly deeper than the calculated depth of 390 nm. Observations after in situ annealing revealed cavities and nickel-rich precipitates. Radiation damage models are invoked to explain the microstructures observed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 27: Symposium E – Ion Implantation and Ion Beam Processing of Materials , 1983 , 407
Copyright
Copyright © Materials Research Society 1984

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Footnotes

*

Research sponsored by the Division of Materials Sciences, U.S. Department of Energy under contract W–7405–eng–26 with the Union Carbide Corporation

References

REFERENCES

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