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Metal-Organic Chemical Vapor Deposition Routes to Films of Transparent Conducting Oxides

Published online by Cambridge University Press:  10 February 2011

A. Wang ,
S. C. Cheng ,
J. A. Belot ,
R. J. Mcneely ,
J. Cheng ,
B. Marcordes ,
T. J. Marks ,
J. Y. Dai ,
R.P.H. Chang  and
J. L. Schindler
...Show all authors
A. Wang
Affiliation:
Department of Chemistry, Computer Engineering Materials Research Center, Northwestern University, Evanston, IL 60208, tjmarks@casbah.acns.nwu.edu
S. C. Cheng
Affiliation:
Department of Chemistry, Computer Engineering Materials Research Center, Northwestern University, Evanston, IL 60208, tjmarks@casbah.acns.nwu.edu
J. A. Belot
Affiliation:
Department of Chemistry, Computer Engineering Materials Research Center, Northwestern University, Evanston, IL 60208, tjmarks@casbah.acns.nwu.edu
R. J. Mcneely
Affiliation:
Department of Chemistry, Computer Engineering Materials Research Center, Northwestern University, Evanston, IL 60208, tjmarks@casbah.acns.nwu.edu
J. Cheng
Affiliation:
Department of Chemistry, Computer Engineering Materials Research Center, Northwestern University, Evanston, IL 60208, tjmarks@casbah.acns.nwu.edu
B. Marcordes
Affiliation:
Department of Chemistry, Computer Engineering Materials Research Center, Northwestern University, Evanston, IL 60208, tjmarks@casbah.acns.nwu.edu
T. J. Marks
Affiliation:
Department of Chemistry, Computer Engineering Materials Research Center, Northwestern University, Evanston, IL 60208, tjmarks@casbah.acns.nwu.edu
J. Y. Dai
Affiliation:
Department of Materials Science and Engineering, Computer Engineering Materials Research Center, Northwestern University, Evanston, IL 60208
R.P.H. Chang
Affiliation:
Department of Materials Science and Engineering, Computer Engineering Materials Research Center, Northwestern University, Evanston, IL 60208
J. L. Schindler
Affiliation:
Department of Electrical and Computer Engineering Materials Research Center, Northwestern University, Evanston, IL 60208
M.P. Chudzik
Affiliation:
Department of Electrical and Computer Engineering Materials Research Center, Northwestern University, Evanston, IL 60208
C. R. Kannewurf
Affiliation:
Department of Electrical and Computer Engineering Materials Research Center, Northwestern University, Evanston, IL 60208
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Abstract

This contribution reports the in situ growth of transparent, conducting GaxIn2-xO3 and ZnkIn2Ok+3 films by MOCVD (metal-organic chemical vapor deposition) techniques using In(dpm)3, Ga(dpm)3, and Zn(dpm)2 (dpm = dipivaloylmethanate) as volatile precursors. In the former series, film microstructure in the x = 0.4 – 1.0 range is predominantly cubic with 25° C electrical conductivities as high as 1300 S/cm (n-type; carrier density = 1.2 × 1020 cm−3, mobility = 68 cm2/Vs) and optical transparency in the visible region greater than that of ITO. In the latter series, films in the composition range K = 0.16 – 3.60 were studied; the microstructural systematics are rather complex. Electrical conductivities (25° C) as high as 1000 S/cm (n-type; carrier density = 3.7 × 1020 cm−3, mobility = 18.6 cm2/Vs) for K = 0.66 were measured. The optical transparency window is significantly broader than that of ITO.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 495: Symposium W – Chemical Aspects of Electronic Ceramics Processing , 1997 , 3
Copyright
Copyright © Materials Research Society 1998

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References

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