Published online by Cambridge University Press: 21 February 2011
Microchemical and microstructural study has been carried out on the tungsten-aluminum nitride (W-AlN) thick film metallization interface. A reaction has been found to occur with the formation of precipitates at AlN grain boundaries and also within the AlN grains; a thin crystalline grain boundary film was also observed. The interface morphology and chemistry is compared to the molybdenum/manganese-aluminum nitride (MoMn-AlN) interface. The effects of morphology and microchemical variations upon thermal conductivity are discussed.