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Mechanical Properties of Carbon Films for Thin Film Disks

Published online by Cambridge University Press:  16 February 2011

Richard L. White ,
Mary F. Doerner  and
George W. Walker
Richard L. White
Affiliation:
IBM Corp., General Products Division, San Jose, CA 95193
Mary F. Doerner
Affiliation:
IBM Corp., General Products Division, San Jose, CA 95193
George W. Walker
Affiliation:
IBM Corp., General Products Division, San Jose, CA 95193
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Abstract

Carbon overcoat films are used extensively in thin film disk applications to provide wear resistance. A nano-indentation technique and wafer curvature measurements have been used to study the mechanical properties of carbon films sputtered under various processing conditions. Specifically, the effects of substrate/target spacing, power, pressure, and substrate bias have been studied for films sputtered in an argon plasma. The relationship of these properties to contact start-stop performance of hydrocarbon lubricated disks is further described. The frictional performance during the test can be related to film hardness, while the durability can be affected by the residual film stress.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 188: Symposium K – Thin Films: Stresses and Mechanical Properties II , 1990 , 213
Copyright
Copyright © Materials Research Society 1990

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References

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