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Local Laser Induced Etching of Copper Films by Chlorine

Published online by Cambridge University Press:  21 February 2011

Hua Tang  and
Irving P. Herman
Hua Tang
Affiliation:
Department of Applied Physics and Microelectronics Sciences Laboratories, Columbia University, New York, NY 10027
Irving P. Herman
Affiliation:
Department of Applied Physics and Microelectronics Sciences Laboratories, Columbia University, New York, NY 10027
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Abstract

A focused argon ion laser was used to induce local thermal etching of copper films in the presence of chlorine gas. Raman scattering was used to follow the transformation of the copper film in situ to CuC1 and CuCl2. In some regimes the laser only induced transformation of copper to copper chloride, while in others the laser produced copper chloride and also desorbed it.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 158: Symposium B – In-Situ Patterning: Selective Area Deposition and Etching , 1989 , 331
Copyright
Copyright © Materials Research Society 1990

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References

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