Hostname: page-component-5b777bbd6c-2c8nx Total loading time: 0 Render date: 2025-06-24T08:14:30.975Z Has data issue: false hasContentIssue false
  • English
  • Français

LiCoO2 Thin Films Grown by Pulsed Laser Deposition on Low Cost Substrates

Published online by Cambridge University Press:  10 February 2011

D. S. Ginley ,
J. D. Perkins ,
J. M. McGraw ,
P. A. Parilla ,
M.L. Fu  and
C. T. Rogers
D. S. Ginley
Affiliation:
National Renewable Energy Laboratory, Golden CO, University of Colorado, Boulder CO
J. D. Perkins
Affiliation:
National Renewable Energy Laboratory, Golden CO, University of Colorado, Boulder CO
J. M. McGraw
Affiliation:
National Renewable Energy Laboratory, Golden CO, University of Colorado, Boulder CO
P. A. Parilla
Affiliation:
National Renewable Energy Laboratory, Golden CO, University of Colorado, Boulder CO
M.L. Fu
Affiliation:
National Renewable Energy Laboratory, Golden CO, University of Colorado, Boulder CO
C. T. Rogers
Affiliation:
National Renewable Energy Laboratory, Golden CO, University of Colorado, Boulder CO
Get access

Abstract

We report on the use of pulsed laser depositon (PLD) to grow thin films of LiCoO2 on a number of low cost substrates including SnO2 coated Upilex, stainless steel and SnO2 coated glass. Highly textured (001) films grown on CVD deposited SnO2 films on 7059 glass, were obtained at 200 to 500 mTorr O2 and a temperature of 500 C. Similar texture was not obtained on the stainless or Upilex however dense films from crystalline to amorphous were obtained. The films were characterized by x-ray diffraction and Raman spectroscopy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 496: Symposium Y – Materials For Electrochemical Energy Storage & Conversion II… , 1997 , 293
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

REFERENCES

[1] Wei, G., Haas, T.E. and Goldner, R.B. Proc. - Electrochem. Soc. 1990, 90–2, 80–8.Google Scholar
[2] Wei, G. Thesis, 1991.Google Scholar
[3] Shokoohi, F.K. and Tarascon, J.M. In U.S., 1992; pp.Google Scholar
[4] Plichta, E.J. and Behl, W.K. Proc. - Electrochem. Soc. 1993, 93–24, 59–67.Google Scholar
[5] Plichta, E.J. and Behl, W.K. J. Electrochem. Soc. 1993, 140, 46–9.Google Scholar
[6] Wang, B., Bates, J.B., Luck, C.F., Sales, B.C., Zuhr, R.A. and Robertston, J.D. Proc.- Electrochem. Soc. 1996, 95–22, 183–92.Google Scholar
[7] Chen, C., Kelder, E.M., van der Put, P.J.J.M. and Schoonman, J. J. Mater. Chem. 1996, 6, 765–771.10.1039/jm9960600765Google Scholar
[8] Chen, C.H., Buysman, A.A.J., Kelder, E.M. and Schoonman, J. Solid State Ionics 1995, 80, 1–4.Google Scholar
[9] Chen, C.H., Kelder, E.M., van der Put, P.J.J.M. and Schoonman, J. Proc. - Electrochem. Soc. 1996, 96–14, 43–57.Google Scholar
[10] Fragnaud, P., Brousse, T. and Schleich, D.M. J. Power Sources 1996, 63, 187–191.Google Scholar
[11] Fragnaud, P., Nagarajan, R., Schleich, D.M. and Vujic, D. J. Power Sources 1995, 54, 362–6.Google Scholar
[12] Scheich, D.M. “Thin film inorganic electrochemical systems,” 1995.Google Scholar
[13] Uchida, I. and Sato, H. J. Electrochem. Soc. 1995, 142, L139–L141.Google Scholar
[14] Fauteux, D.G., Massucco, A., Shi, J. and Lampe-Onnerud, C. J. Appl. Electrochem. 1997, 27, 543–549.Google Scholar
[15] Dominey, L.A., Blakley, T.J., Koch, V.R., Vujic, D.R. and Schleich, D.M. Proc. Int. Power Sources Symp. 1992, 35th, 290–3.10.1109/IPSS.1992.282086Google Scholar
[16] Striebel, K.A., Deng, C.Z. and Cairns, E.J. Mater. Res. Soc. Symp. Proc. 1995, 393, 85–90.10.1557/PROC-393-85Google Scholar
[17] Striebel, K.A., Deng, C.Z., Wen, S.J. and Cairns, E.J. J. Electrochem. Soc. 1996, 143, 1821–1827.Google Scholar
[18] Antaya, M., Dahn, J.R., Preston, J.S., Rossen, E. and Reimers, J.N. J. Electrochem. Soc. 1993, 140, 575–8.10.1149/1.2056123Google Scholar
[19] Antaya, M., Cearns, K., Preston, J.S., Reimers, J.N. and Dahn, J.R. J. Appl. Phys. 1994, 76, 2799–806.Google Scholar
[20] Amatucci, G.G., Tarascon, J.M. and Klein, L.C. J. Electrochem. Soc. 1996, 143, 1114–23.Google Scholar
[21] Reimers, J.N. and Dahn, J.R. J. Electrochem. Soc. 1992, 139, 2091–7.Google Scholar
[22] Inaba, M., Iriyama, Y., Ogumi, Z., Todzuka, Y. and Tasaka, A. J. Raman Spectrosc. 1997, 28, 613–617.Google Scholar
[23] Huang, C.K., Surampudi, S., Attia, A.I. and Halpert, G. In U. S. Pat. Appl., 1993; pp.Google Scholar