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Laser-Induced Formation of Thin Silicone Layers with High Purity

Published online by Cambridge University Press:  21 February 2011

W. Roth ,
H.-J. Henkel ,
K.W. Hoffmann  and
H. Markert
W. Roth
Affiliation:
Siemens Research Laboratories, P.O. BOX 3220, D-8520 Erlangen, Federal Republic of Germany
H.-J. Henkel
Affiliation:
Siemens Research Laboratories, P.O. BOX 3220, D-8520 Erlangen, Federal Republic of Germany
K.W. Hoffmann
Affiliation:
Siemens Research Laboratories, P.O. BOX 3220, D-8520 Erlangen, Federal Republic of Germany
H. Markert
Affiliation:
Siemens Research Laboratories, P.O. BOX 3220, D-8520 Erlangen, Federal Republic of Germany
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Abstract

Unsaturated and saturated oligomeric siloxanes were polymerized by laser irradiation in the UV range without the use of photoinitiators. The obtained silicon layers possess high purity and non-corrosive effects.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 154: Symposium K – Electronic Packaging Materials Science IV , 1989 , 161
Copyright
Copyright © Materials Research Society 1989

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References

1. Sumiyoshi, T., Schnabel, W., Henne, A. and Lechtken, P., Polymer 26, 141 (1985).Google Scholar
2. Sumiyoshi, T. and Schnabel, W., Makromol. Chem. 186, 1811 (1985).Google Scholar
3. Sumiyoshi, T., Schnabel, W. and Henne, A., J. Photochem. _30, 63 (1980).Google Scholar
4. Decker, C., J. Polym., Polym. Chem. Ed. 21, 2451 (1983); Polym. Photochem. 3, 131 (1983).Google Scholar
5. Noll, W., Chemie und Technologie der Silicone, 2. Aufl. (Verlag Chemie, Weinheim, 1968).Google Scholar