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Kinetics of Molecular Beam Epitaxy: Effect of Ion-Induced Sputtering

Published online by Cambridge University Press:  25 February 2011

Peter M. Richards
Peter M. Richards*
Affiliation:
Sandia National Laboratories, Albuquerque, New Mexico 87185-5800
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Abstract

Steady state roughness of surfaces growing by molecular beam epitaxy is investigated by Monte Carlo simulations under conditions where an ion beam is also present which sputters adatoms off the surface. If the sputtering is random, it only increases the roughness. But if the sputtering probability is strongly dependent on the binding energy of an adatom within a cluster or island, the ions can have a smoothening effect. Physical arguments are given in support of the results.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 202: Symposium C – Evolution of Thin Film and Surface Microstructure , 1990 , 353
Copyright
Copyright © Materials Research Society 1991

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References

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