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The Interaction of Laser Generated Methyl Radicals with Cd, Te, and CdTe Surfaces

Published online by Cambridge University Press:  21 February 2011

J.J. Zinck ,
G.L. Olson ,
P.D. Brewer  and
J.E. Jensen
J.J. Zinck
Affiliation:
Hughes Research Laboratories, Malibu, CA
G.L. Olson
Affiliation:
Hughes Research Laboratories, Malibu, CA
P.D. Brewer
Affiliation:
Hughes Research Laboratories, Malibu, CA
J.E. Jensen
Affiliation:
Hughes Research Laboratories, Malibu, CA
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Abstract

The mechanism of the interaction of methyl radicals with Cd, Te, and CdTe surfaces has been studied in ultrahigh vacuum by Auger electron spectroscopy and thermal desorption mass spectrometry. Methyl radicals generated by the laser photodissociation of acetone at 193 nm efficiently etch both Te and Te-rich CdTe surfaces. However, there is no evidencefor reaction of methyl radicals with Cd or stoichiometric CdTe. A temperature dependencein the rate of methyl radical etching of Te-rich CdTe is related to a competition between acetone scavanging of radicals on the surface and reaction of radicals to form volatile metalorganics. Acetone itself has a small but finite reaction probability with Te and Te-rich CdTe surfaces.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 158: Symposium B – In-Situ Patterning: Selective Area Deposition and Etching , 1989 , 289
Copyright
Copyright © Materials Research Society 1990

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References

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