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In-Situ Characterization Of Ultra-Small Magnetic Junctions Made By Electrochemical Techniques

Published online by Cambridge University Press:  21 March 2011

A. Sokolov ,
J.R. Jennings ,
C-S Yang ,
J. Redepenning  and
B. Doudin
A. Sokolov
Affiliation:
Department of Physics and Astronomy, University of Nebraska-Lincoln, Lincoln NE 68588-0111, U.S.A
J.R. Jennings
Affiliation:
Department of Physics and Astronomy, University of Nebraska-Lincoln, Lincoln NE 68588-0111, U.S.A
C-S Yang
Affiliation:
Department of Physics and Astronomy, University of Nebraska-Lincoln, Lincoln NE 68588-0111, U.S.A
J. Redepenning
Affiliation:
Department of Chemistry University of Nebraska-Lincoln, Lincoln NE 68588-0111, U.S.A
B. Doudin
Affiliation:
Department of Chemistry University of Nebraska-Lincoln, Lincoln NE 68588-0111, U.S.A
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Abstract

Electrochemical impedance spectroscopy is used to characterize the growth of NiO over Ni electrodes. We find a limited increase of thickness and a significant increase of porosity of the oxide as a function of time and anodization potential. Conductance measurements performed on Ni/NiO/Co junctions of 30 nm diameters indicate the presence of a Coulomb blockade at low temperatures and small bias. Tunneling is observed at higher bias. Small magnetoresistance ratios (1%) are found.

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References

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