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Inductively-Coupled Plasma Nitriding of Fused Silica

Published online by Cambridge University Press:  28 February 2011

T. K. Vethanayagam  and
P. F. Johnson
T. K. Vethanayagam
Affiliation:
College of Ceramics, Alfred University, Alfred, NY 14802
P. F. Johnson
Affiliation:
College of Ceramics, Alfred University, Alfred, NY 14802
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Abstract

Plasma nitriding of fused silica has been performed over a temperature range of 750°C to 1300°C in a nitrogen-hydrogen plasma generated by an inductively coupled RF discharge. The plasma is used as both thermal and chemical source. The effects of various process parameters such as surface temperature, gas pressure and treatment time on total nitrogen content have been studied. The advantages and the drawbacks of this direct plasma nitriding technique are briefly discussed.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 75: Symposium B – Photon, Beam, and Plasma Stimulated Chemical Processes at Surfaces , 1986 , 793
Copyright
Copyright © Materials Research Society 1987

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