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Highly Oriented Yba2Cu3O7-X Thin Films Prepared by Unbalanced Dc Magnetron Sputtering From a Single Stoichiometric Target

Published online by Cambridge University Press:  28 February 2011

N. Savvides ,
C. Andrikidis ,
D.V. Hensley ,
R. Drivers ,
J-C Macfarlane ,
N.X. Tan  and
A.J. Bourdillon
N. Savvides
Affiliation:
CSIRO Division of Applied Physics, Sydney, Australia 2070
C. Andrikidis
Affiliation:
CSIRO Division of Applied Physics, Sydney, Australia 2070
D.V. Hensley
Affiliation:
CSIRO Division of Applied Physics, Sydney, Australia 2070
R. Drivers
Affiliation:
CSIRO Division of Applied Physics, Sydney, Australia 2070
J-C Macfarlane
Affiliation:
CSIRO Division of Applied Physics, Sydney, Australia 2070
N.X. Tan
Affiliation:
School of Materials Science and Engineering,
A.J. Bourdillon
Affiliation:
School of Materials Science and Engineering,
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Abstract

Highly oriented films of YBa2Cu3O7‐x have been reproducibly prepared with the correct metal stoichiometry by dc magnetron sputtering from a single target of stoichiometric composition. To circumvent the resputtering effects, the magnetron used an unbalanced magnetic field configuration to direct the plasma away from the substrate. Typical films have sharp superconducting transitions with Tc up to 93 K and △TC(90%.‐10%.)=0.5 K, metallic resistivity above the transition with ρ300/ρ100=2‐4, and Jc>1.5xl06 A cm‐2 at 4.2 K. The temperature dependence of J,. obeys the flux creep model with activation energy U(0)=75 meV.

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