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Hardness and Deformation Mechanisms of Highly Elastic Carbon Nitride Thin Films as Studied By Nanoindentation

Published online by Cambridge University Press:  15 February 2011

S. V. Hainsworth ,
H. Sjöström ,
T. F. Page  and
J-E. Sundgren
S. V. Hainsworth
Affiliation:
Materials Division, Department of Mechanical, Materials and Manufacturing Engineering, The University of Newcastle, Newcastle upon Tyne, UK
H. Sjöström
Affiliation:
Thin Films Division, Department of Physics, Linköping University, Linköping, Sweden.
T. F. Page
Affiliation:
Materials Division, Department of Mechanical, Materials and Manufacturing Engineering, The University of Newcastle, Newcastle upon Tyne, UK
J-E. Sundgren
Affiliation:
Thin Films Division, Department of Physics, Linköping University, Linköping, Sweden.
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Abstract

Carbon nitride (CNx) thin films (0.18<x<0.43), deposited by magnetron sputtering of C in a N2 discharge, have been observed to be extremely resistant to plastic deformation during surface contact (i.e. exhibit a purely elastic response over large strains). Elastic recoveries as high as 90% have been measured by nanoindentation. This paper addresses the problems of estimating Young's modulus (E) and hardness (H) in such cases and shows how different strategies involving analysis of both loading and unloading curves and measuring the work of indentation each present their own problems. The results of some cyclic contact experiments are also presented and possible deformation mechanisms in the fullerene-like CNx structures discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 436: Symposium CC – Thin Films Stresses and Mechanical Properties VI , 1996 , 275
Copyright
Copyright © Materials Research Society 1997

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