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Hard Carbon Films with Various Microstructure Prepared by Ion Assisted Evaporation

Published online by Cambridge University Press:  22 February 2011

J. Ullmann ,
A. Weber  and
U. Falke
J. Ullmann
Affiliation:
Technische Universität Chemnitz-Zwickau, Fachbereich Physik, Reichenhainer Str. 70, D-09009 Chemnitz, Germany
A. Weber
Affiliation:
Technische Universität Chemnitz-Zwickau, Fachbereich Physik, Reichenhainer Str. 70, D-09009 Chemnitz, Germany
U. Falke
Affiliation:
Technische Universität Chemnitz-Zwickau, Fachbereich Physik, Reichenhainer Str. 70, D-09009 Chemnitz, Germany
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Abstract

For a deeper understanding of the creation of carbon films the hydrogen-free ion assisted evaporation (IAE) method with neon species was used. Variation of the ion parameters energy and ion to neutral arrival ratio, delivering the necessary energy for modification of the film growth, results in different microstructures investigated with EELS, HRTEM and TED as well as different microhardnesses measured by dynamical Vickers indentation. A possible film growth mechanism is proposed based on an ion etching of mainly sp2-bonded carbon surface atoms and on defect dominated structure modification below the surface depending on the ion energy

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 316: Symposium A – Materials Synthesis and Processing Using Ion Beams , 1993 , 911
Copyright
Copyright © Materials Research Society 1994

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References

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