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Hard Amorphous Hydrogenated Carbon Films Deposited from an Expanding Thermal Plasma

Published online by Cambridge University Press:  15 February 2011

J. W. A. M. Gielen ,
M. C. M. Van De Sanden ,
W. M. M. Kessels  and
D. C. Schram
J. W. A. M. Gielen
Affiliation:
Eindhoven University of Technology, Department of Physics, PO Box 513, 5600 MB Eindhoven, The Netherlands - m.c.m.v.d.sanden @phys.tue.nl
M. C. M. Van De Sanden
Affiliation:
Eindhoven University of Technology, Department of Physics, PO Box 513, 5600 MB Eindhoven, The Netherlands - m.c.m.v.d.sanden @phys.tue.nl
W. M. M. Kessels
Affiliation:
Eindhoven University of Technology, Department of Physics, PO Box 513, 5600 MB Eindhoven, The Netherlands - m.c.m.v.d.sanden @phys.tue.nl
D. C. Schram
Affiliation:
Eindhoven University of Technology, Department of Physics, PO Box 513, 5600 MB Eindhoven, The Netherlands - m.c.m.v.d.sanden @phys.tue.nl
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Abstract

Diamondlike amorphous hydrogenated carbon is deposited from an expanding thermal argon/acetylene plasma. It is observed that the film quality improves with increasing deposition rate. To obtain the best material quality the admixed acetylene flow has to be of comparable magnitude as the argon ion flow from the plasma source (critical loading). A new method to determine the ion density in an argon/acetylene plasma, by probe measurements, is presented. They reveal that the deposition during critical loading is governed by radicals. It is suggested that acetylene is dissociated once and that the C2H radical is formed dominantly.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 436: Symposium CC – Thin Films Stresses and Mechanical Properties VI , 1996 , 287
Copyright
Copyright © Materials Research Society 1997

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