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Gas Phase Reactions Relevant to Chemical Vapor Deposition: Numerical Modeling

Published online by Cambridge University Press:  21 February 2011

D. Burgess Jr  and
M. R. Zachariah
D. Burgess Jr
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
M. R. Zachariah
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
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Abstract

Numerical modeling of gas phase chemical kinetics was used to investigate reactions following silane decomposition to suggest experimental conditions and to interpret concentrations measurements. The effects of concentration and temperature gradients on kinetic pathways and reactive intermediates were studied. These processes are relevant to silicon-based chemical vapor deposition (CVD), to flame-driven gas phase particle nucleation, and to laser-induced processes for materials fabrication.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 168 , 1989 , 31
Copyright
Copyright © Materials Research Society 1990

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