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Focused Electron Beam Induced Deposition of Gold and Rhodium

Published online by Cambridge University Press:  10 February 2011

P. Hoffmann ,
I. Utke ,
F. Cicoira ,
B. Dwir ,
K. Leifer ,
E. Kapon  and
P. Doppelt
P. Hoffmann
Affiliation:
Institute of Applied Optics, Swiss Federal Institute of Technology Lausanne, CH-1015 Lausanne-EPFL, Switzerland, Patrik.Hoffmann@epfl.ch
I. Utke
Affiliation:
Institute of Applied Optics, Swiss Federal Institute of Technology Lausanne, CH-1015 Lausanne-EPFL, Switzerland
F. Cicoira
Affiliation:
Institute of Applied Optics, Swiss Federal Institute of Technology Lausanne, CH-1015 Lausanne-EPFL, Switzerland
B. Dwir
Affiliation:
Institute of Micro- and Optoelectronics, Swiss Federal Institute of Technology Lausanne, CH-1015 Lausanne-EPFL, Switzerland
K. Leifer
Affiliation:
Institute of Micro- and Optoelectronics, Swiss Federal Institute of Technology Lausanne, CH-1015 Lausanne-EPFL, Switzerland
E. Kapon
Affiliation:
Institute of Micro- and Optoelectronics, Swiss Federal Institute of Technology Lausanne, CH-1015 Lausanne-EPFL, Switzerland
P. Doppelt
Affiliation:
ESPCI-CNRS, 10 rue Vauquelin, 75231Paris Cedex 05, France
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Abstract

Electron beam induced deposition with two noble metal precursors (Rhodium and Gold) having the same halogeno and trifluorophosphine ligands is presented. The deposit geometry of lines and freestanding bridges is discussed with respect to electron energy, beam shape, and backscattered electron distribution. Electron beam heating effects are estimated to be negligible in our deposition conditions. Using PF3AuCl, lines of percolating gold grains were deposited with electrical resistivities as low as 22μωcm at room temperature (Au: 2.2μωcm). Auger electron analysis shows about 60at% Rh in deposits obtained with [RhCI(PF3)2]2, however the resistivity of 1ωcm is high compared to 4.5μωcm of pure Rh.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 624: Symposium V – Materials Development for Direct Write Technologies , 2000 , 171
Copyright
Copyright © Materials Research Society 2000

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References

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