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Ferroelectric Thin Films Deposited by Laser Ablation

Published online by Cambridge University Press:  16 February 2011

K. Ramkumar ,
J. Lee ,
A. Safari  and
S.C. Danforth
K. Ramkumar
Affiliation:
Glenn Howatt Laboratory; Department of Ceramic Engineering, Rutgers University, Piscataway, NJ 08855–0909
J. Lee
Affiliation:
Glenn Howatt Laboratory; Department of Ceramic Engineering, Rutgers University, Piscataway, NJ 08855–0909
A. Safari
Affiliation:
Glenn Howatt Laboratory; Department of Ceramic Engineering, Rutgers University, Piscataway, NJ 08855–0909
S.C. Danforth
Affiliation:
Glenn Howatt Laboratory; Department of Ceramic Engineering, Rutgers University, Piscataway, NJ 08855–0909
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Abstract

The deposition of thin films of ferroelectric materials by the laser ablation technique was investigated. The films were grown by ablation from a bulk target of lead zirconate titanate (PZT) exposed to laser pulses from CO2 amd KrF excimer lasers. The effects of deposition and annealing conditions on the structure and stoichiometry of the films were studied.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 200: Symposium Y – Ferroelectric Thin Films I , 1990 , 121
Copyright
Copyright © Materials Research Society 1990

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References

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