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Electrophotographic Patterning of a-Si:H

Published online by Cambridge University Press:  15 February 2011

H. Gleskova ,
S. Wagner  and
D. S. Shen
H. Gleskova
Affiliation:
Princeton University, Department of Electrical Engineering, Princeton, NJ 08544
S. Wagner
Affiliation:
Princeton University, Department of Electrical Engineering, Princeton, NJ 08544
D. S. Shen
Affiliation:
University of Alabama in Huntsville, Department of Electrical and Computer Engineering, Huntsville, AL 35899
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Abstract

A novel laser-printing method for the manufacturing of the backplane circuits of active-matrix liquid-crystal displays (AMLCD) is proposed and demonstrated. Xerographic toner is used as an etch mask for amorphous silicon (a-Si:H) and for the seeding of metal lines. We also demonstrate for the first time the direct-print patterning of silicon on ∼ 50 μm thick glass foil.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 377: Symposium A – Amorphous Silicon Technology 1995 , 1995 , 719
Copyright
Copyright © Materials Research Society 1995

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References

REFERENCES

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