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Electrical Characterization of Ferroelectric Thin Films of Lithium Niobate on Silicon Substrates

Published online by Cambridge University Press:  16 February 2011

Robert C. Baumann ,
Timothy A. Rost  and
Thomas A. Rabson
Robert C. Baumann
Affiliation:
Department of Electrical and Computer Engineering, Rice University, Houston, TX 77005
Timothy A. Rost
Affiliation:
Department of Electrical and Computer Engineering, Rice University, Houston, TX 77005
Thomas A. Rabson
Affiliation:
Department of Electrical and Computer Engineering, Rice University, Houston, TX 77005
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Abstract

Thin films (.1-.6 μm) of LiNbO3 have been deposited on silicon substrates by rf reactive sputtering. MFS (metal-ferroelectric-semiconductor) capacitor structures were created by a liftoff process which physically isolated small areas of LiNbO3. Standard MOS (metal-oxide-semiconductor) electrical characterization techniques were used to determine the resistivity and dielectric constant of the films. Short-circuit photocurrent measurements revealed both transient and steady state components attributed to a pyroelectric effect and a bulk photovoltaic effect respectively. The conduction processes in these films were examined and found to exhibit Frenkel-Poole characteristics. Ferroelectric switching at room temperature has also been observed in these films, however, the reversed orientation was not stable.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 200: Symposium Y – Ferroelectric Thin Films I , 1990 , 31
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

1. Baumann, R.C., Rost, T.A., and Rabson, T.A., Proceedings of the 1990 Sprina Meeting (San Francisco, CA: Materials Research Society, 1990), p.Google Scholar
2. Nassau, K., Levinstein, H.J., Loiacono, G.M., J. Phys. Chem. Solids 27, 989–996 (1966).Google Scholar
3. Zylbersztejn, A., Appl. Phys. Lett. 29 (12), 778–779 (1976).Google Scholar
4. Clark, M.G., DiSalvo, F. J., Glass, A.M., and Peterson, G.E., J. Chem. Phys. 59 (12), 6209–6219 (1973).Google Scholar
5. Camlibel, I., J. Appl. Phys. 40 (1), 1690–1693 (1969).Google Scholar